1. Assessing failure in epitaxially encapsulated micro-scale sensors using micro and nano x-ray computed tomography
- Author
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Yunhan Chen, Dongsuk D. Shin, Thomas W. Kenny, Lizmarie Comenencia Ortiz, David B. Heinz, W Kenny Thomas, Anne L. Alter, and Ian B. Flader
- Subjects
010302 applied physics ,Fabrication ,Materials science ,Silicon ,business.industry ,Scale (chemistry) ,Process (computing) ,chemistry.chemical_element ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Epitaxy ,01 natural sciences ,Mechanical system ,chemistry ,0103 physical sciences ,Nano ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,General Materials Science ,Tomography ,0210 nano-technology ,business - Abstract
Millions of micro electro mechanical system sensors are fabricated each year using an ultra-clean process that allows for a vacuum-encapsulated cavity. These devices have a multi-layer structure that contains hidden layers with highly doped silicon, which makes common imaging techniques ineffective. Thus, examining device features post-fabrication, and testing, is a significant challenge. Here, we use a combination of micro- and nano-scale x-ray computed tomography to study device features and assess failure mechanisms in such devices without destroying the ultra-clean cavity. This provides a unique opportunity to examine surfaces and trace failure mechanisms to specific steps in the fabrication process.
- Published
- 2018
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