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Ablacija iskrom je atraktivna tehnika sinteze tankih, nanoporoznih filmova metala i metalnih oksida. Iskra nastala uslijed električnog pražnjenja u atmosferi inertnog plina uništava materijal elektroda s kojih se kondenzacijom formiraju nanočestice. Odabir procesnih parametara značajno utječe na karakteristike filma koje pak utječu na primjenska svojstva filma. U ovom radu je ablacijom bakrovih elektroda provedena sinteza tankih filmova bakrovih oksida koji inače imaju široku primjenu u području optike, senzora, elektronike itd. Promjenom protoka uvedenog kisika, vremena provedbe procesa i naknadnom termičkom obradom uzoraka dobiveni su filmovi različitih debljina i homogenosti; veličina i oblika čestica te hrapavosti površine čija se karakterizacija provela mikroskopom atomskih sila. Spark ablation is an attractive technique for the synthesis of thin, nanoporous metal and metal oxides films. The spark caused by an electric discharge in atmosphere of an inert gas destroys the material of electrodes from which nanoparticles are formed by condensation. Selection of process parameters significantly affects the characteristics of the film of which affect the application and features of the film. In this work, the ablation of copper electrodes conducted the synthesis of copper oxide thin films which are commonly used in field of optics, sensors, electronics, etc. By changing the flow of introduced oxygen, the process implementation time and the subsequent heat treatment of the samples, films of different thicknesses and homogeneities, with different particle sizes and shapes and surface roughness were obtained. Characterization of films is made with atomic force microscopy.