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Thin films of the α polymorphic modification of a nickel phthalocyanine (NiPc) which possess a high sensitivity to actions of gaseous media are deposited by the thermal vacuum deposition method. Indium tin oxide (ITO) continuous thin films on glass are used as substrates. On the basis of these films, the barrier structure ITO/NiPc/Al has been formed. We have found that there exists the electrogeneration effect in the ITO/NiPc/Al structure under the action of the gaseous ammonia medium. The appearance of a short circuit current and an open circuit voltage is observed only in the ITO/NiPc/Al structures that can be explained by redox reactions. [ABSTRACT FROM AUTHOR]

The effect of vacuum deposition temperature on the structure and electrooptical properties of polyaniline (PAN) thin films has been studied. In ellipsometry investigations, it has been found that films deposited at 300-400°C at a pressure of 1 × 10-6 Torr with 20-40 nm thickness possess an optical anisotropy. The films obtained at a deposition temperature of 450°C are characterized by a high electrochemical and electrooptical activity. They have an improved morphology and oxidation-reduction stability as compared to those of the films formed by the electrochemical polymerization method. [ABSTRACT FROM AUTHOR]