1. Influence of Sinking-Gate on Al0.24Ga0.76As/In0.22Ga0.78As Double Heterojunction High Electron Mobility Transistors
- Author
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Wen Shiung Lour, Wei-Tien Chen, Hong-Rung Chen, Meng-Kai Hsu, and Shao-Yen Chiu
- Subjects
Materials science ,business.industry ,law ,Transistor ,Induced high electron mobility transistor ,Optoelectronics ,Heterojunction ,High electron ,business ,law.invention - Abstract
The influence of gate metal with thermal annealed process adopt to control the distance between gate and channel on pseudomorphic Al0.24Ga0.76As/ In0.22Ga0.78As double heterojunction high electron mobility transistors (DH-HEMTs) were studied. Compared to device with gate-recess process, the distance of gate-to-channel could be controlled through the thermal annealed process and therefore exhibit a lower series resistance. Measured transconductance of 150 mS/mm and an open- drain voltage gain of 136 for the DH-HEMT with an as deposited gate are enhanced to 175 mS/mm and 160 for the DH-HEMT with a 330-{degree sign}C annealed gate. Good device linearity is also obtained with a low second-harmonic to fundamental ratio of 3.55 %. In addition, good microwave performances such as unit-current gain- and maximum power gain- frequency were also obtained from devices with gate-annealed process.
- Published
- 2007
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