1. Edge Effect and Compensation Method Research of the Template Electrochemical Etching
- Author
-
Guan Wang, Hong Yu Wei, and Zhong Ning Guo
- Subjects
Materials science ,Current distribution ,business.industry ,Mechanical Engineering ,Analytical chemistry ,Edge (geometry) ,Microstructure ,Compensation (engineering) ,Machining ,Mechanics of Materials ,Etching (microfabrication) ,Electrode ,Optoelectronics ,General Materials Science ,Electrochemical etching ,business - Abstract
Uniformity is an important index of the template electrochemical etching. Due to the uneven current distribution between the two electrodes, the etching depth of the workpiece center and edge are significantly different,and the deviation of which is up to 15% or more. In this study, the causes of edge effect is analyzed. A compensation method is proposed and proved by experiments.The results show that: this method is simple, and the uniformity can be reduced to about 3%. It is suitable for the processing of high uniformity requirements in microstructure machining.
- Published
- 2014
- Full Text
- View/download PDF