1. p-Type Doping of 4H- and 3C-SiC Epitaxial Layers with Aluminum
- Author
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Marc Portail, Adrien Michon, Pawel Kwasnicki, Marcin Zielinski, Sylvie Contreras, Thierry Chassagne, Hervé Peyre, Sandrine Juillaguet, Leszek Konczewicz, Roxana Arvinte, NOVASiC, Savoie Technolac, NOVASiC, Centre de recherche sur l'hétéroepitaxie et ses applications (CRHEA), Université Nice Sophia Antipolis (... - 2019) (UNS), COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-COMUE Université Côte d'Azur (2015-2019) (COMUE UCA)-Centre National de la Recherche Scientifique (CNRS)-Université Côte d'Azur (UCA), Laboratoire Charles Coulomb (L2C), and Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
010302 applied physics ,Materials science ,Hybrid physical-chemical vapor deposition ,Mechanical Engineering ,Al content ,chemistry.chemical_element ,Nanotechnology ,02 engineering and technology ,Chemical vapor deposition ,Substrate (electronics) ,Combustion chemical vapor deposition ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Epitaxy ,01 natural sciences ,chemistry ,Chemical engineering ,Mechanics of Materials ,Aluminium ,0103 physical sciences ,[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,General Materials Science ,P type doping ,0210 nano-technology ,ComputingMilieux_MISCELLANEOUS - Abstract
Exhaustive experimental study of aluminum incorporation in epitaxial 4H-SiC and 3C‑SiC films grown by chemical vapor deposition (CVD) was performed. The influence of polytype and substrate orientation was verified. Role of principal process conditions (growth temperature and pressure, deposition rate, chemical environment) was investigated in details. Finally, the evolution of optical properties of resulting SiC films with Al content was examined.
- Published
- 2016
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