1. The Study on Magnetron Sputtering Rate of Metal Targets
- Author
-
Liang Ting Cai, Xing Lai Che, Ci Zhao, Xiong Li, Yan An Hu, Hai Lang Ju, Xiaobai Chen, and Jun Gao
- Subjects
Metal ,Materials science ,Sputtering ,Hall effect ,visual_art ,General Engineering ,Analytical chemistry ,visual_art.visual_art_medium ,Sample preparation ,High-power impulse magnetron sputtering ,Sputter deposition ,Line (formation) - Abstract
The sputtering rate of Pt, Au, Fe and Co targets was researched and they were 0.059 nm/s, 0.076 nm/s, 0.050 nm/s, and 0.030nm/s respectively. A series of magnetic multilayers were prepared using the calibrated rate and the anomalous hall effect of the samples were tested, and Hall curve was in line with expectations. The sputtering rate of Pt, Au, Fe and Co targets was appropriate for sample preparation. Suitable sputtering rate play a decisive role in sample preparation.
- Published
- 2014
- Full Text
- View/download PDF