1. The Preparation and Characterization of Small Mesopores in Siloxane-Based Materials That Use Cyclodextrins as Templates
- Author
-
Jingyu Hyeon-Lee, Seok Chang, Sang Kook Mah, Hyun-Dam Jeong, Jin-Heong Yim, Y.-Y. Lyu, Jozeph Park, I.-S. Hwang, Sunghoon Song, J.N. Sun, David W. Gidley, and Y. F. Hu
- Subjects
Materials science ,Percolation threshold ,Dielectric ,engineering.material ,Condensed Matter Physics ,Silsesquioxane ,Electronic, Optical and Magnetic Materials ,Biomaterials ,chemistry.chemical_compound ,chemistry ,Chemical engineering ,Coating ,Siloxane ,Polymer chemistry ,Electrochemistry ,engineering ,Spectroscopy ,Mesoporous material ,Refractive index - Abstract
Porous thin films containing very small closed pores (∼ 20 A) with a low dielectric constant (∼ 2.0) and excellent mechanical properties have been prepared using the mixture of cyclic silsesquioxane (CSSQ) and a new porogen, heptakis(2,3,6-tri-O-methyl)-β-cyclodextrin (tCD). The pore sizes vary from 16.3 A to 22.2 A when the content of tCD in the coating mixture increases to 45 wt.-% according to positronium annihilation lifetime spectroscopy (PALS) analysis. It has also been found that the pore percolation threshold (the onset of pore interconnectivity) occurs as the ∼ 50 % tCD porogen load. The dielectric constants (k = 2.4 ∼ 1.9) and refractive indices of these porous thin films decreased systematically as the amount of porogen loading increased in the coating mixture. The electrical properties and mechanical properties of such porous thin films were fairly good as interlayer dielectrics.
- Published
- 2003
- Full Text
- View/download PDF