1. Deposition of Hydrogenated Amorphous Carbon Films by an ECR Microwave Plasma
- Author
-
Olaf Stenzel, K. Hammer, W. Scharff, B. Eibisch, T. Fradenheim, and S. Roth
- Subjects
Carbon film ,Materials science ,Electrical resistance and conductance ,Ion beam ,Amorphous carbon ,Analytical chemistry ,Deposition (phase transition) ,Condensed Matter Physics ,Ion source ,Microwave ,Electronic, Optical and Magnetic Materials ,Characterization (materials science) - Abstract
The deposition of a-C:H films by an ECR microwave plasma and an ECR microwave ion beam source is described. Optical, electrical, mechanical measurements and different analytical methods are used for the film characterization. The films deposited of a rate of about 200 nm/min develops a high electrical resistance (109 to 1014ω cm), a good IR transparency, an optical gap of about 1.7 eV, and a hardness up to 30 GPa (measured on Si-substrates).
- Published
- 1989
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