1. Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning.
- Author
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Pellegrin, Eric, Sics, Igors, Reyes-Herrera, Juan, Sempere, Carlos Perez, Alcolea, Juan Josep Lopez, Langlois, Michel, Rodrigueza, Jose Fernandez, and Carlino, Vincent
- Subjects
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CARBON products manufacturing , *PRESSURE regulators , *SYNCHROTRONS , *FORCE density , *PRESSURE gages - Abstract
Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the contamination process as well as the cleaning/remediation strategies are not understood and the corresponding cleaning procedures are still under development. In this study an analysis of remediation strategies all based on in situ low-pressure RF plasma cleaning approaches is reported, including a quantitative determination of the optimum process parameters and their influence on the chemistry as well as the morphology of optical test surfaces. It appears that optimum results are obtained for a specific pressure range as well as for specific combinations of the plasma feedstock gases, the latter depending on the chemical aspects of the optical surfaces to be cleaned. [ABSTRACT FROM AUTHOR]
- Published
- 2014
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