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Block copolymer (BCP) self-assembly in thin films is an elegant method to generate nanometric features with tunable geometrical configurations. By combining directed assembly and hybridization methods, advances in nano-manufacturing have been attested over the past decades with flagship applications in lithography and optics. Nevertheless, the range of geometrical configurations is limited by the accessible morphologies inherent to the energy minimization process involved in BCP self-assembly. Layering of nanostructured BCP thin films has been recently proposed in order to enrich the span of nanostructures derived from BCP self-assembly with the formation of non-native heterostructures such as double-layered arrays of nanowires or dots-on-line and dots-in-hole hierarchical structures. In this work, the layer-by-layer method is further exploited for the generation of nano-mesh arrays using nanostructured BCP thin films. In particular, a subtle combination of chemical and topographical fields is leveraged in order to demonstrate design rules for the controlled registration of a BCP layer on top of an underneath immobilized one by the precise tuning of the interfacial chemical field between the two BCP layers., (© 2022 The Authors. Small published by Wiley-VCH GmbH.)

Zeolitic imidazolate frameworks (ZIFs) are a sub-class of metal-organic frameworks (MOFs). Although generally stable, ZIFs can undergo post-synthetic linker exchange (PSLE) in solution under mild conditions. Herein, we present a novel, solvent-free approach to post-synthetic linker exchange through exposure to linker vapor., (© 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.)

3-Miktoarm star terpolymer architecture (3µ-ABC), consisting of three dissimilar polymer chains, A, B, and C connected at a junction point, provides a unique opportunity in the design of complex nanoscale patterns such as Archimedean tilings that are not accessible from linear ABC terpolymers. In this work, the synthesis and the self-assembly of 3-miktoarm star terpolymers, namely, polystyrene-arm-poly(2-vinylpyridine)-arm-polyisoprene (3µ-SPI) into Archimedean tiling patterns is described. Several 3µ-SPI terpolymers are produced via a mid-functional PS-b-P2VP, synthesized by sequential anionic polymerization, using a 1,1-diphenylethylene bearing a tert-butyldimethylsilyl-protected hydroxyl functionality as a core molecule. PI arms with different sizes are then linked to the deprotected hydroxyl function of the core molecule via a Steglich esterification. Solvent-annealed 3µ-SPI thin films exhibit nanoscale prisms arranged into a (4.6.12) Archimedean tiling pattern. Depending on the size of the low etch-resistant PI arm and the solvent selected to promote the self-assembly of 3µ-SPI thin films, the voided columns occupy the square or decagonal sites of the (4.6.12) pattern. The use of this (4.6.12) tiling produced for the first time from self-assembled 3µ-ABC thin films can be a promising route to build 2D photonic crystals having complete photonic band gaps, where the light propagation is completely prohibited., (© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

The synthesis and self-assembly in thin-film configuration of linear ABC triblock terpolymer chains consisting of polystyrene (PS), poly(2-vinylpyridine) (P2VP), and polyisoprene (PI) are described. For that purpose, a hydroxyl-terminated PS-b-P2VP (45 kg mol -1 ) building block and a carboxyl-terminated PI (9 kg mol -1 ) are first separately prepared by anionic polymerization, and then are coupled via a Steglich esterification reaction. This quantitative and metal-free catalyst synthesis route reveals to be very interesting since functionalization and purification steps are straightforward, and well-defined terpolymers are produced. A solvent vapor annealing (SVA) process is used to promote the self-assembly of frustrated PS-b-P2VP-b-PI chains into a thin-film core-shell double gyroid (Q 230 , space group: Ia3¯d) structure. As terraces are formed within PS-b-P2VP-b-PI thin films during the SVA process under a CHCl 3 vapor, different plane orientations of the Q 230 structure ((211), (110), (111), and (100)) are observed at the polymer-air interface depending on the film thickness., (© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Nanotemplates derived from the self-assembly of AB-type block copolymers provide an elegant route to achieve well-defined metallic dot arrays, even if the variety of pattern symmetries is restricted due to the limited number of structures offered by microphase separated diblock copolymers. A strategy that relies on the use of complex network structures accessible through the self-assembly of linear ABC-type terpolymers is presented for the formation of metallic nanodots arrays with "outside-the-box" symmetries. Patterned templates formed by the cubic Q 214 and orthorhombic O 70 network structures are used as excellent platforms to build well-ordered gold nanodot arrays with unique p3m1 and p2 symmetries, respectively. A simple yet efficient blending strategy is used to tune the critical dimensions of the p3m1 pattern while laterally ordered gold nanodot arrays are also demonstrated through a directed self-assembly approach. Such highly ordered gold nanodots with tunable particle dimensions and array periods, enabling the control of their plasmonic responses, are attractive probes for biological imaging., (© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

The directed self-assembly of diblock copolymer chains (poly(1,1-dimethyl silacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 µm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films., (© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Laterally ordered nanorings with a periodicity of 38 nm are produced from the directed self-assembly of poly(1,1-dimethylsilacyclobutane)-block-polystyrene-block-poly(methyl methacrylate) thin films on topographically patterned substrates. Such nanoscale arrays with vertically oriented rings are highly desired in technological applications including memory using magnetic recording, metamaterial, waveguide, etc., (© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Well-defined single-ion diblock copolymers consisting of a Li-ion conductive poly(styrenesulfonyllithium(trifluoromethylsulfonyl)imide) (PSLiTFSI) block associated with a glassy polystyrene (PS) block have been synthesized via reversible addition fragmentation chain transfer polymerization. Conductivity anisotropy ratio up to 1000 has been achieved from PS-b-PSLiTFSI thin films by comparing Li-ion conductivities of out-of-plane (aligned) and in-plane (antialigned) cylinder morphologies at 40 °C. Blending of PS-b-PSLiTFSI thin films with poly(ethylene oxide) homopolymer (hPEO) enables a substantial improvement of Li-ion transport within aligned cylindrical domains, since hPEO, preferentially located in PSLiTFSI domains, is an excellent lithium-solvating material. Results are also compared with unblended and blended PSLiTFSI homopolymer (hPSLiTFSI) homologues, which reveals that ionic conductivity is improved when thin films are nanostructured., (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders., (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions., (© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

A poly(ionic liquid)-based block copolymer (PIL BCP), namely, poly(vinyl acetate)-b-poly(N-vinyl-3-butylimidazolium bromide), PVAc-b-PVBuImBr, is synthesized by sequential cobalt-mediated radical polymerization (CMRP). A PVAc precursor is first prepared at 30 °C in bulk by CMRP of VAc, using bis(acetylacetonato)cobalt(II), Co(acac)2, and a radical source (V-70). Growth of PVBuImBr from PVAc-Co(acac)2 is accomplished by CMRP in DMF/MeOH (2:1, v/v). This PIL BCP self-assembles in the sub-micron size range into aggregated core-shell micelles in THF, whereas polymeric vesicles are observed in water, as evidenced by dynamic light scattering (DLS) and transmission electron microscopy (TEM). Thin-solid sample cut from raw materials analyzed by TEM shows an ordered lamellar organization by temperature-dependent synchrotron small-angle X-ray scattering (SAXS). Anion exchange can be accomplished to achieve the corresponding PIL BCP with bis(trifluorosulfonyl)imide (Tf2 N(-)) anions, which also gives rise to an ordered lamellar phase in bulk samples. A complete suppression of SAXS second-order reflection suggests that this compound has a symmetric volume fraction (f ≈ 0.5). SAXS characterization of both di- and triblock PIL BCP analogues previously reported also shows a lamellar phase of very similar behavior, with only an increase of the period by about 8% at 60 °C., (© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

We have overcome the cost and time consumption limitations of common lithography techniques used to control the self-assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub-layer. The guiding pattern is a sinusoidal surface-relief grating interferometrically inscribed onto an azobenzene containing copolymer sub-layer leading to a defect-free single grain of block copolymer domains., (Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

The addition of a block copolymer to the polymer/fullerene blend is a novel approach to the fabrication of organic solar cells. The block copolymer (P3HT-b-P4VP) is used as nanostructuring agent in the active layer. A significant enhancement of the cell efficiency is observed, in correlation with morphology control, both before (as-cast) and after the annealing process., (Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

The post-functionalization of poly(3-hexylthiophene) (P3HT) via various synthetic routes is reported. Well-defined and monofunctionalized ω-thiol-terminated P3HT, ω-carboxylic acid-terminated P3HT, ω-acrylate-terminated P3HT, and ω-methacrylate-terminated P3HT are obtained in high yields through a straightforward procedure. From those, different novel P3HT-based graft copolymers are synthesized following two routes: "grafting onto" and "grafting through" (macromonomer polymerization) methods. The synthesis of three types of graft copolymers is described. Each one has "rod" P3HT-grafted side chains on a "coil" main chain, which can be polyisoprene, poly(vinyl alcohol), or poly(butyl acrylate). Each copolymer is characterized by size-exclusion chromatography and NMR., (Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)