1. The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells.
- Author
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Chen, Bitao, Zhang, Yingke, Ouyang, Qiuping, Chen, Fei, Zhan, Xinghua, and Gao, Wei
- Subjects
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THIN film crystallography , *SILICON solar cells , *CHEMICAL vapor deposition , *PLASMA gases , *PERFORMANCE of silicon solar cells - Abstract
SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3 passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell. [ABSTRACT FROM AUTHOR]
- Published
- 2017
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