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The topography of surfaces produced by metal additive manufacturing is a challenge for optical measurement systems such as focus variation microscopes. These irregularities can lead to artifacts, such as incorrectly measured protrusions or spikes, hampering reliable topographic characterization. In order to eliminate this problem, we introduce a new algorithm based on dual convolving a vertical Sobel operator with cross sections of an image stack parallel to the scanning direction of the so-called depth scan. This has proven beneficial in order to distinguish the focus region from out-of-focus areas where outliers are frequently detected. This paper introduces a method for deriving self-adaptive thresholds from the convolution result and compares the effects of different operators in creating self-adaptive thresholds. Additionally, a simulation model of focus variation microscopy is introduced to validate both the measuring system and the proposed algorithm, thereby enhancing the overall performance of focus variation microscopy. Finally, comparisons of measurement results on rough metal additive manufacturing workpieces with and without self-adaptive thresholds are discussed to demonstrate the algorithm's effectiveness.The utilization of self-adaptive thresholds demonstrably reduces the uncertainty range in roughness parameter calculations. For example, in the case of an additive manufactured metal sample due to outlier elimination, the S z roughness value reduces from 543 µm to 413 µm. [ABSTRACT FROM AUTHOR]

Topographical as well as microscopic imaging of nanoscale surfaces plays a pivotal role across various disciplines. Nevertheless, achieving fast, label-free, and accurate characterization of laterally expanded structures below the diffraction limit remains challenging. Recent studies highlight the use of microsphere assistance for resolution improvement. Confocal microscopy, augmented by microspheres, enables the imaging of small structures that were previously inaccessible. This is experimentally compared with microsphere-assisted microscopy (MAM) to underline the decisive role of the confocal effect.

We present how to develop virtual microcylinder- or microsphere-assisted surface topography measurement instruments. As the most critical part, the interaction between light, microcylinder and measurement object is considered based on the finite element method (FEM). Results are obtained for microcylinder-assisted conventional, interference, and confocal microscopes without necessity to repeat the time-consuming FEM simulations for each sensor.

Enhancing the lateral resolution in optical microscopy and interferometry is of great interest in recent research. In order to laterally resolve structures including feature dimensions below the Abbe resolution limit, microspheres in the optical near-field of the specimen are shown to locally improve the resolution of the imaging system. Experimental and simulated results following this approach are obtained by a high NA Linnik interferometer and analyzed in this contribution. They show the reconstructed surface of a 1D phase grating below the resolution limit. For further understanding of the transfer characteristics, measured interference data are compared with FEM (finite element method) based simulations with respect to the polarization dependency of the relevant image information for 1D phase gratings. Therefore, the implemented Koehler illumination as well as the experimental setup utilize polarized light.

Due to their contactless and fast measuring capabilities, laser interferometers represent an interesting alternative to tactile stylus instruments for surface profilometry. In addition to these outstanding attributes, acquisition costs play a major role in industry, limiting the frequent use of optical profilometers, which are significantly more expensive than tactile profilometers. We present a low-cost laser distance-measuring interferometer featuring axial repeatability below 1 nm at acquisition rates of 38,000 height values per second. The sensor's performance is validated on several surface standards, achieving lateral scan velocities up to 160 mm/s. Further to high scan velocities, the high acquisition rate enables improved measurement accuracy by averaging measured height values. For example, the standard deviation of 625 pm for repeated measurements can be reduced to 265 pm at the expense of the data rate. However, the sensor concept provides the potential for further improvements in data rate and measurement repeatability. [ABSTRACT FROM AUTHOR]

Enhancing the lateral resolution limit in optical microscopy and interferometry is of great interest in recent research. In order to laterally resolve structures including feature dimensions below the resolution limit, microspheres applied in the optical near-field of the specimen are shown to locally improve the resolution of the imaging system. Experimental and simulated results following this approach obtained by a high NA Linnik interferometer are analyzed in this contribution. For further understanding of the transfer characteristics, measured interference data are compared with FEM (finite element method) based simulations with respect to the polarization dependency of the relevant image information.

We present an extended vectorial Kirchhoff model of coherence scanning interferometry including several vector rotations occurring in the imagining and scattering process as well as polarization dependent reflection coefficients. For validation simulated results are compared to those of the conventional scalar Kirchhoff model and a rigorous finite element modeling.