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TiSiCN coatings have been obtained by anode evaporation of titanium and the decomposi-tion of hexamethyldisilazane in an arc discharge, using a self-heated hollow cathode, at the pressure rate of 1 mTorr of the Ar+N2 gas mixture. The proposed method makes it possible to independently and widely change the amount of metal and precursor vapor flows, the pressure and composition of the vapor-gas mixture and the degree of ionic interaction on the surface of the growing coating within a single discharge system. The paper presents the method and the results of the effect of a current discharge (10–50 A), and the flux of precursor vapours (0–1 g/h), on deposition rates, compositions, and properties of TiSiCN coatings deposited by an advanced combined PVD+PECVD method. Dense homogeneous TiSiCN coatings up to 6 µm thick and up to 27.5 GPa in hardness were obtained at 7.5 µm/h. The composition of the obtained coatings has been studied by X-ray diffraction and X-ray photoelectron spectroscopy, and it has been shown that the presented methods can form nanocomposite coatings with nanocrystallites TiC, TiN, and TiCxN1−x 3–10 nm in the amorphous matrix based on SiCN. © 2022 by the authors. Licensee MDPI, Basel, Switzerland. Russian Science Foundation, RSF: 20-79-10059 Funding: This research was funded by Russian Science Fund, grant number 20-79-10059.

International audience; The aim of this paper is first a better understanding of DC reactive magnetron sputtering and its implications, such as the hysteresis effect and the process instability. In a second part, this article is devoted to an example of specific application: Aluminium Nitride. AlN thin films have been deposited by reactive triode sputtering. We have studied the effect of the nitrogen contents in the discharge and the RF bias voltage on the growth of AlN films on Si(100) deposited by triode sputtering. Stoichiometry and crystal orientation of AlN films have been characterized by means of Fourier-transform infrared spectroscopy, X-ray diffraction and secondary electron microscopy. Dense and transparent AlN layers were obtained at high deposition rates. These films have a (002) orientation whatever the nitrogen content in the discharge, but the best crystallised ones are obtained at low value (10%). A linear relationship was observed between the AlN lattice parameter "c" (perpendicular to the substrate surface) and the in-plane compressive stress. Applying an RF bias to the substrate leads to a (100) texture, and films become amorphous. Moreover, the film's compressive stress increases up to a value of 8GPa before decreasing slowly as the bias voltage increases.; O objetivo desse artigo, em um primeiro momento, é uma melhor compreensão da vaporização em um ambiente magnetron reativo DC e as suas conseqüências, tais como o efeito da histeresis e o processo de instabilidade. A segunda parte desse trabalho está dedicada a um estudo de caso: o nitreto de alumínio. Filmes finos de nitreto de alumínio foram depositados por vaporização triodo reativa. Estudamos o efeito dos teores de nitrogênio, na descarga, e da voltagem RF(bias), no crescimento dos filmes de AlN em Si(100) depositados por vaporização triodo. A estequiometria e a orientação cristalina dos filmes de AlN foram caracterizadas por espectroscopia infravermelha em transformada de Fourier, difração de raios X e microscopia de elétrons secundários. Camadas densas e transparentes de AlN foram obtidas em altas taxas de deposição. Independentemente do conteúdo em nitrogênio na descarga, os filmes têm uma orientação (002), mas, para um teor de 10%, obteve-se a melhor cristalização.Uma relação linear foi observada entre o parâmetro de rede c (perpendicular à superfície do substrato) do AlN e as tensões compressivas planas.A aplicação de um "bias" RF ao substrato leva a uma textura (100) e os filmes tornam-se amorfos. Além disso, a tensão compressiva aumenta atingindo valores de até 8Gpa antes de diminuírem lentamente na medida em que o "bias" aumenta.

Small reservoirs of agriculture-dominated areas experience severely increased sediment input caused by soil erosion on cultivated slopes, also accompanied at some locations by gully erosion. This causes rapid decrease of the reservoir water storage and shortened periods of functioning. In this paper we discuss several examples of the 137Cs-based short-term siltation chronology of small reservoirs located in different landscape zones within the agricultural belt of European Russia. From two to four time marks could have been established in 137Cs depth distribution curves constructed from detailed depth-incremental sampling of reservoir infill sediment, allowing reconstruction of sediment microstratigraphy and deposition rates. In combination with other independent information sources this provides insight on the relative importance of recent land use changes and climatic variability in controlling sediment delivery within small agriculture-dominated fluvial systems. In combination with sediment redistribution studies, it has become possible to construct closed sediment budgets for catchments of several reservoirs and make a quantitative assessment of sediment delivery variability. Such information is important for appropriate design and management of small agricultural reservoirs in Russia. Copyright © 2013 IAHS Press.