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1. Integrating high-k dielectrics: etched polysilicon or metal gates? (Etch)

Author: Schram, Tom, Beckx, Stephan, De Gendt, Stefan, Vertommen, Johan, and Lee, Steve
Subjects: United States
Abstract: OVERVIEW There is an immediate need for reduced gate leakage/higher capacitance gate stacks for stand-by low power applications. For high-performance applications, where leakage is less of a restraining factor, the […]
Published: 2003

2. Integration of HIMOS Flash Memory in a 90nm CMOS Technology

Author: De Vos, Joeri, primary, Haspeslagh, Luc, additional, Demand, Marc, additional, Redolfi, Augusto, additional, Baerts, Christina, additional, Beckx, Stephan, additional, Vleugels, Frank, additional, and Van Houdt, Jan, additional
Published: 2006
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