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We demonstrate Ge0.95Sn0.05 p-channel gate-all-around field-effect transistors (p-GAAFETs) with sub-3 nm nanowire width (WNW) on a GeSn-on-insulator (GeSnOI) substrate using a top-down fabrication process. Thanks to the excellent gate control by employing an aggressively scaled nanowire structure, Ge0.95Sn0.05 p-GAAFETs exhibit a small subthreshold swing (SS) of 66 mV/decade, a decent on-current/off-current (ION/IOFF) ratio of ∼1.2 × 106, and a high-field effective hole mobility (μeff) of ∼115 cm2/(V s). In addition, we also investigate quantum confinement effects in extremely scaled GeSn nanowires, including threshold voltage (VTH) shift and IOFF reduction with continuous scaling of WNW under 10 nm. The phenomena observed from experimental results are substantiated by the calculation of GeSn bandgap and TCAD simulation of electrical characteristics of devices with sub-10 nm WNW. This study suggests Ge-based nanowire p-FETs with extremely scaled dimension hold promise to deliver good performance to enable further scaling for future technology nodes. National Research Foundation (NRF) This work at NUS was supported by Singapore Ministry of Education (MOE) Tier 2 (MOE2018-T2-2-154) and MOE Tier 1 (R-263-000-D65-114). Prof. Fan Weijun acknowledges the support from the National Research Foundation Singapore (NRF-CRP19-2017-01).

Temporomandibular joint disorders (TMDs) are a group of disorders which are complex and multifactorial. The identification of the major etiologic factors are essential for the success of any therapeutical procedures. Diagnosis of TMDs are mainly based on thorough clinical examination along with the analysis of presenting signs and symptoms.Sometimes, other diagnostic tests are used inorder to gather more information or to confirm the clinical diagnosis. Various imaging modalities are used to identify the morphology of the joint as well as to study the functional relationship of the condyle to the fossa. This article aims at discussing briefly the various diagnostic imaging techniques of TMDs. &nbsp

We report on the growth of an In[subscript 0.30]Ga[subscript 0.70]As channel high-electron mobility transistor (HEMT) on a 200 mm silicon wafer by metal organic vapor phase epitaxy. By using a 3 μm thick buffer comprising a Ge layer, a GaAs layer and an InAlAs compositionally graded strain relaxing buffer, we achieve threading dislocation density of (1.0 ± 0.3) × 10[superscript 7]cm[subscript -2] with a surface roughness of 10 nm RMS. No phase separation was observed during the InAlAs compositionally graded buffer layer growth. 1.4 μm long channel length transistors are fabricated from the wafer with I[subscript DS] of 70 μA/μm and g[subscript m] of above 60 μS/μm, demonstrating the high quality of the grown materials., Singapore-MIT Alliance for Research and Technology (SMART)