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In this work, we demonstrate the MBE growth of a systematic series of GaAsBi/GaAs multiple quantum well devices with up to 120 periods and report on their structural and optical characterisation. TEM images confirm the incorporation of a record number of wells for this material, while showing reasonable thickness uniformity. Fitting of the XRD data becomes worse as the number of quantum wells increases due to strain relaxation and out-of-plane growth inhomogeneity. The devices are compared to a previous series of devices grown in our group using PL and are found to have less severe strain relaxation due to the thicker barriers and lower average strain in the MQW stack, despite containing a greater number of wells.

GaAsBi has been researched as a candidate material for optoelectronic devices for around two decades. Bi-induced localized states induce a rapid rising of the valence band edge through a band anticrossing interaction, which has a profound effect on the bandgap and the spin–orbit splitting. The band engineering possible, even with just a few percent bismuth, makes GaAsBi an attractive material for THz emitters, telecommunication lasers, and low noise photodetectors, among other devices. There has been substantial progress in some of these areas; however, progress toward many of the potential applications of GaAsBi has been hindered by device quality issues, brought about by the low substrate temperatures necessary for the growth of GaAsBi with sufficiently large Bi fractions. This review, presents an overview of the applications for which GaAsBi has been advocated and the key results in these areas. The molecular beam epitaxy growth and postgrowth processing of GaAsBi are then explored as well as the novel techniques that have been suggested to improve material quality.

A series of gallium arsenide bismide device layers covering a range of growth conditions are thoroughly probed by low-temperature, power-dependent photoluminescence measurements. The photoluminescence data is modelled using a localised state profile consisting of two Gaussians. Good agreement with the raw data is achieved for all layers whilst fixing the standard deviation values of the two Gaussians and constraining the band gap using X-ray diffraction data. The effects of growth temperature and bismuth beam equivalent pressure on the localised state distributions, and other model variables, are both shown to be linked to emission linewidth and device properties. It is concluded that bismuth rich surface conditions are preferable during growth in order to produce the narrowest emission linewidths with this material. These results also show how the growth mode of a gallium arsenide bismide layer can be inferred ex-situ from low-temperature photoluminescence measurements.

The measurement of a wide temperature range in a scene requires hardware capable of high dynamic range imaging. We describe a novel near-infrared thermal imaging system operating at a wavelength of 940 nm based on a commercial photovoltaic mode high dynamic range camera and analyse its measurement uncertainty. The system is capable of measuring over an unprecedently wide temperature range; however, this comes at the cost of a reduced temperature resolution and increased uncertainty compared to a conventional CMOS camera operating in photodetective mode. Despite this, the photovoltaic mode thermal camera has an acceptable level of uncertainty for most thermal imaging applications with an NETD of 4–12 °C and a combined measurement uncertainty of approximately 1% K if a low pixel clock is used. We discuss the various sources of uncertainty and how they might be minimised to further improve the performance of the thermal camera. The thermal camera is a good choice for imaging low frame rate applications that have a wide inter-scene temperature range.

Avalanche Photodiodes (APDs) are key semiconductor components that amplify weak optical signals via the impact ionization process, but this process’ stochastic nature introduces ‘excess’ noise, limiting the useful signal to noise ratio (or sensitivity) that is practically achievable. The APD material’s electron and hole ionization coefficients (α and β respectively) are critical parameters in this regard, with very disparate values of α and β necessary to minimize this excess noise. Here, the analysis of thirteen complementary p-i-n/n-i-p diodes shows that alloying GaAs with ≤ 5.1 % Bi dramatically reduces β while leaving α virtually unchanged—enabling a 2 to 100-fold enhancement of the GaAs α/β ratio while extending the wavelength beyond 1.1 µm. Such a dramatic change in only β is unseen in any other dilute alloy and is attributed to the Bi-induced increase of the spin-orbit splitting energy (∆so). Valence band engineering in this way offers an attractive route to enable low noise semiconductor APDs to be developed.

The dark current characteristics of two series of bulk GaAsBi p-i-n diodes are analysed as functions of temperature and band gap. Each temperature dependent measurement indicates that recombination current dominates in these devices. The band gap dependence of the dark currents is also consistent with recombination dominated current for the devices grown at a common growth temperature, indicating that the presence of Bi does not directly adversely affect the dark currents. However, the devices grown at different growth temperatures exhibit a faster increase in dark current with decreasing device band gap, suggesting that a reduced growth temperature causes a reduction in minority carrier lifetime.

A series of strained GaAsBi/GaAs multiple quantum well diodes are characterised to assess the potential of GaAsBi for photovoltaic applications. The devices are compared with strained and strain-balanced InGaAs based devices.\ud \ud The dark currents of the GaAsBi based devices are around 20 times higher than those of the InGaAs based devices. The GaAsBi devices that have undergone significant strain relaxation have dark currents that are a further 10–20 times higher.\ud \ud Quantum efficiency measurements show the GaAsBi devices have a lower energy absorption edge and stronger absorption than the strained InGaAs devices. These measurements also indicate incomplete carrier extraction from the GaAsBi based devices at short circuit, despite the devices having a relatively low background doping. This is attributed to hole trapping within the quantum wells, due to the large valence band offset of GaAsBi.

Raman spectroscopy and magneto-photoluminescence measurements under high magnetic fields were used to investigate the optical and spin properties of GaBiAs/GaAs multiple quantum wells (MQWs). An anomalous negative diamagnetic energy shift was observed at higher temperatures and higher laser intensities, which was associated to a sign inversion of hole effective mass in these structures. In addition, an enhancement of the polarization degree with decreasing of laser intensity was observed (experimental condition where the emission is dominated by localized excitons). This effect was explained by changes of spin relaxation and exciton recombination times due to exciton localization by disorder.

Letter written to the editor and printed in the 1906 December 3 edition of the Los Angeles Times regarding Walter Lindley's suitability to the office of mayor.