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In this study, a 6 nm layer of Magnesium Silicate (Mg-Silicate) was deposited on AlGaN/GaN heterostructure by sputtering of multiple stacks of MgO and SiO$_{2}$, followed by rapid thermal annealing in a nitrogen (N$_{2}$) environment. The X-ray photoelectron spectroscopy (XPS) analysis confirmed the stoichiometric Mg-Silicate (MgSiO$_{3}$) after being annealed at a temperature of 850 $^\circ$C for 70 seconds. Atomic force microscopy (AFM) was employed to measure the root mean square (RMS) roughness (2.20 nm) of the Mg-Silicate. A significant reduction in reverse leakage current, by a factor of three orders of magnitude, was noted for the Mg-Silicate/AlGaN/GaN metal-oxide-semiconductor (MOS) diode in comparison to the Schottky diode. The dielectric constant of Mg-Silicate($\mathcal{E}_{Mg-Silicate}$) and the interface density of states (D$_{it}$) with AlGaN were approximated at $\sim$ 6.6 and 2.0 $\times$ 10$^{13}$ cm$^{-2}$eV$^{-1}$ respectively, utilizing capacitance-voltage (CV) characteristics.

The nanowire-supported quantum dot (NWQD) of GaN is an unconventional nanostructure, which is extremely promising for realization of UV photonics in general, and room-temperature single photon generation, in particular. While GaN-NWQDs have several promising attributes, the crucial challenge in exploiting their full potential, is to reduce the lateral dimensions of the QDs, to the order of the exciton Bohr-radius in GaN. Also critical is to suppress the built-in electric field due to spontaneous and piezoelectric polarization, which adversely affects the radiative recombination lifetime. We report here the innovation of a simple yet powerful single-step epitaxial growth technique, to achieve both of these targets. By combining controlled and on-demand thermal decomposition of GaN nanowires, with our previously-developed strategy of inhibiting the same via AlN-capping, we demonstrate that the NWQD-diameter can indeed be reduced to the truly strong-quantum-confinement limit. In these ultra-scaled GaN QDs, we show that the built-in electric fields are almost completely suppressed. The NWQD fabrication-strategy developed in this work may pave the way for fabrication of highly efficient classical and quantum UV-emitters based on GaN.

The rapidly increasing interest in nanowires (NWs) of GaN and associated III-Nitrides for (opto-)electronic applications demands immediate addressal of the technological challenges associated with both NW-growth and device processing. Towards this end, we demonstrate in this work an approach to suppress thermal decomposition of GaN NWs, which also serves to remedy the effect of NW-coalescence during growth. While both these effects are well-known to be major hurdles in the development of GaN-NW-devices, reliable methods to tackle these issues have not been reported so far. We show that by providing a thin AlN cap layer, which epitaxially grows only on the top-facet of the GaN NWs, thermal decomposition can be almost completely suppressed. Thermal annealing of GaN NW-ensembles, post AlN-capping, leads to selective decomposition of uncapped/partially-capped NWs, leaving behind (mostly) AlN-capped GaN NWs, with superior crystal- and luminescence characteristics. This simple yet extremely effective approach may therefore serve as a very crucial milestone in the roadmap of GaN-NW-based (opto-)electronic technology.

The present study elucidates the correlation between the structural and optical properties of GaN nanowires grown on Si(111) substrate by plasma assisted molecular beam epitaxy (PA-MBE) technique under various growth conditions. GaN NWs exhibiting different shapes, sizes and distribution were grown at various substrate temperatures with same Ga-N (III-V) ratio of 0.4. We observe that sample grown at lower substrate temperature (~700 degC) results 2-dimensional island like structure with almost very little (~30%) circularity while increasing substrate temperature (>770 degC) leads to growth of individual GaN NW (>80% circularity) with excellent structural properties. The temperature dependent photoluminescence measurement together with analysis of RAMAN active modes provides legitimate evidences of strong correlation between the structure and optical properties GaN nanowires grown on Si substrates., Comment: 15 pages, 9 figures