1. Sulfaquinoxaline Oxidation and Toxicity Reduction by Photo-Fenton Process.
- Author
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Urbano VR, Maniero MG, Guimarães JR, Del Valle LJ, and Pérez-Moya M
- Subjects
- Hydrogen Peroxide, Hydrogen-Ion Concentration, Oxidation-Reduction, Sulfaquinoxaline, Water Pollutants, Chemical analysis
- Abstract
Sulfaquinoxaline (SQX) has been detected in environmental water samples, where its side effects are still unknown. To the best of our knowledge, its oxidation by Fenton and photo-Fenton processes has not been previously reported. In this study, SQX oxidation, mineralization, and toxicity ( Escherichia coli and Staphylococcus aureus bacteria) were evaluated at two different setups: laboratory bench (2 L) and pilot plant (15 L). The experimental design was used to assess the influence of the presence or absence of radiation source, as well as different H
2 O2 concentrations (94.1 to 261.9 mg L-1 ). The experimental conditions of both setups were: SQX = 25 mg L-1 , Fe(II) = 10 mg L-1 , pH 2.8 ± 0.1. Fenton and photo-Fenton were suitable for SQX oxidation and experiments resulted in higher SQX mineralization than reported in the literature. For both setups, the best process was the photo-Fenton (178.0 mg L-1 H2 O2 ), for which over 90% of SQX was removed, over 50% mineralization, and bacterial growth inhibition less than 13%. In both set-ups, the presence or absence of radiation was equally important for sulfaquinoxaline oxidation; however, the degradation rates at the pilot plant were between two to four times higher than the obtained at the laboratory bench.- Published
- 2021
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