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The adoption of high pressure not only reinforces the comprehension of the structure and exotic electronic states of transition metal dichalcogenides (TMDs) but also promotes the discovery of intriguing phenomena. Here, 1T-TaS2 was investigated up to 100 GPa, and re-enhanced superconductivity was found with structural phase transitions. The discovered I4/mmm TaS2 presents strong electron–phonon coupling, revealing a good superconductivity of the nonlayered structure. The P–T phase diagram shows a dome shape centered at ~20 GPa, which is attributed to the distortion of the 1T structure. Accompanied by the transition to nonlayered structure above 44.5 GPa, the superconducting critical temperature shows an increasing trend and reaches ~7 K at the highest studied pressure, presenting superior superconductivity compared to the original layered structure. It is unexpected that the pressure-induced re-enhanced superconductivity was observed in TMDs, and the transition from a superconductor with complicated electron-pairing mechanism to a phonon-mediated superconductor would expand the field of pressure-modified superconductivity. [ABSTRACT FROM AUTHOR]

Layered transition-metal dichalcogenides (TMDs) have recently attracted intense scientific and engineering interest because of their unique semiconducting and opto-electronic properties. We investigated the pressure-induced structural phase transition of layered semiconductor molybdenum disulfide (MoS2) using Raman spectroscopy and studied its metallization using infrared (IR) spectroscopy under both non-hydrostatic and quasi-hydrostatic conditions. Under quasi-hydrostatic and non-hydrostatic conditions, we found that the structural phase transition from 2 Hc stacking to 2 Ha stacking starts at approximately 16 and 21 GPa, respectively, and finishes at ∼35 and ∼41 GPa, respectively. Furthermore, the structural phase transition was followed by a semiconductor-to-metal (S-M) electronic transition. The pressure point of metallization under quasi-hydrostatic conditions is ∼5 GPa lower than that under non-hydrostatic conditions. [ABSTRACT FROM AUTHOR]

• The high pressure phase transitions of HfSe 2 were studied. • Pressure-induced semiconductor-metal transition appeared in the original P-3m1 phase. • The metallization was due to the overlap of valance and conduction bands with the contribution of Hf d and Se p orbitals. • A new metallic I 4 /mmm structure in HfSe 2 was found under high pressure. [Display omitted] In this study, we report the phase transitions and semiconductor-to-metal (S-M) transition of hafnium selenide (HfSe 2) under high pressure through experiments and theoretical calculations. The starting hexagonal structure transforms to an intermediate phase and I 4 /mmm structure above 10 GPa, and then converts into the I 4 /mmm structure completely above 47.2 GPa. Pressure-induced S-M transition at ~10 GPa was revealed by infrared (IR) reflectivity and resistance measurements. Theoretical calculations indicate that the pressure-induced metallization occurs in the initial hexagonal phase, which arises from the overlap of the valance and conduction bands with the contribution of the Hf d and Se p orbitals under high pressure. Upon pressure releases, the I 4 /mmm phase transforms into the initial hexagonal structure. This work provides new insights into the structures and electronic states of HfSe 2. [ABSTRACT FROM AUTHOR]

Cr 2 Ge 2 Te 6 is a rare layered ferromagnetic semiconductor that represents a promising material for novel thermoelectric and spintronic devices. High pressure is an effective way to change the electronic structure, and profoundly affects the physical and chemical properties of two-dimensional (2D) layered materials. Here we combined experimental results and theoretical calculations to investigate the structural evolution and properties of Cr 2 Ge 2 Te 6 under high pressure. It is found that Cr 2 Ge 2 Te 6 undergoes an isostructural phase transition from layered to non-layered structure at ~14 GPa, accompanied with a semiconductor to metal transition, which is distinct from the previous reports. The pressure-induced metallization is verified by the overlap of the valence and conduction bands, and the layered-to-non-layered isostructural transition is attributed to the enhanced interlayer Te–Te interaction by First-principles calculations. Our results provide a potential pathway to control the structure and property of layered materials and possibility for conceptually new devices via pressure engineering. • Cr 2 Ge 2 Te 6 undergoes an isostructural phase transition at ~14 GPa, and accompanied with a semiconductor to metal transition. • The semiconductor-to-metal transition was verified by IR and electrical experiments. • The metallization mechanism was interpreted by theoretical calculations. [ABSTRACT FROM AUTHOR]