158 results on '"Fogarassy, E."'
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2. Modeling of CW laser diode irradiation of amorphous silicon films
3. Fabrication and investigation of 1D and 2D structures in LiNbO 3 thin films by pulsed laser ablation
4. Dopant diffusion and activation induced by sub-melt laser anneal within the co-implanted p+ polycrystalline silicon gate used in CMOS technologies
5. Treatment of high arsenic content wastewater by membrane filtration
6. Optical–thermal simulation applied to the study of the pattern effects induced by the sub-melt laser anneal process in advanced CMOS technologies
7. Simulation of the sub-melt laser anneal process in 45 CMOS technology—Application to the thermal pattern effects
8. Micro structuring of LiNbO 3 by using nanosecond pulsed laser ablation
9. Fabrication of p+/n Ultra Shallow Junctions (USJ) in silicon by excimer laser doping from spin-on glass sources
10. Field emission properties of a-CNx films prepared by pulsed laser deposition
11. Mechanisms and application of the Excimer laser doping from spin-on glass sources for USJ fabrication
12. Diode laser soldering using a lead-free filler material for electronic packaging structures
13. Thermal stability of amorphous carbon films deposited by pulsed laser ablation
14. Chemical analysis of a-CNx thin films synthesized by nanosecond and femtosecond pulsed laser deposition
15. Super-lateral-growth regime analysis in long-pulse-duration excimer-laser crystallization of a-Si films on SiO2
16. The effects of KrF pulsed laser and thermal annealing on the crystallinity and surface morphology of radiofrequency magnetron sputtered ZnS:Mn thin films deposited on Si
17. Vacuum Ultraviolet and Visible Optical Emission Spectra from Laser Ablation of Graphite at 193 NM: Application to Carbon Nitride Thin Films Deposition
18. Raman investigation of submicro-grained Si films obtained by incoherent UV photo-CVD of silicon hydrides
19. Number density and size distribution of droplets in KrF excimer laser deposited boron carbide films
20. Pulsed laser crystallization of hydrogen-free a-Si thin films for high-mobility poly-Si TFT fabrication
21. Spectroscopic study of the vacuum ultraviolet windowless photodissociation of silicon hydrides for silicon-based film deposition
22. The combined effect of laser fluence and target deterioration in determining the chemical composition of pulsed laser deposited boron carbide films
23. Low-temperature synthesis of silicon oxide, oxynitride, and nitride films by pulsed excimer laser ablation
24. Properties of silicon dioxide films prepared by pulsed-laser ablation
25. On the growth mechanism of pulsed laser deposited carbon nitride films
26. Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics
27. Morphological study of PLD grown carbon films
28. Interference microscopy for nanometric surface microstructure analysis in excimer laser processing of silicon for flat panel displays
29. Long-pulse duration excimer laser annealing of Al + ion implanted 4H-SiC for pn junction formation
30. Polymer photoablation under windowless VUV hydrogen or helium discharge lamp
31. Correlation between surface oxygen content and microstructure of carbon nitride films
32. The effect of process parameters on the chemical structure of pulsed laser deposited carbon nitride films
33. Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy
34. Characterization of CN x films deposited by pulsed laser ablation using spectroscopic ellipsometry
35. Influence of the nitrogen content on the field emission properties of a-CN x films prepared by pulsed laser deposition
36. Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM
37. Long-Pulse Duration Excimer Laser Processing in the Fabrication of High Performance Polysilicon TFTs for Large Area Electronics
38. Experimental and numerical analysis of surface melt dynamics in 200 ns-excimer laser crystallization of a-Si films on glass
39. Correlation between hydrogen content and structure of pulsed laser deposited carbon nitride films
40. Numerical and experimental analysis of pulsed excimer laser processing of silicon carbide
41. Dependence of nitrogen content and deposition rate on nitrogen pressure and laser parameters in ArF excimer laser deposition of carbon nitride films
42. Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies
43. The effects of multiple KrF laser irradiations on the electroluminescence and photoluminescence of rf-sputtered ZnS:Mn-based electroluminescent thin film devices
44. Ablation study on pulsed KrF laser annealed electroluminescent ZnS:Mn/Y 2O 3 multilayers deposited on Si
45. A new process to manufacture thin SiGe and SiGeC epitaxial films on silicon by ion implantation and excimer laser annealing
46. Pulsed KrF laser annealing of RF sputtered ZnS:Mn thin films
47. Surface melt dynamics and super lateral growth regime in long pulse duration excimer laser crystallization of amorphous Si films
48. UV laser incorporation of dopants into silicon: Comparison of two processes.
49. A model for laser induced diffusion.
50. Pulsed laser annealing of rf sputtered amorphous Si-H films doped with arsenic.
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