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1. Characterization of Pd/Y multilayers with B

Author

M Y, Wu, Q S, Huang, K, Le Guen, V, Ilakovac, B X, Li, Z S, Wang, A, Giglia, J P, Rueff, and P, Jonnard

Abstract

Pd/Y multilayers are high-reflectance mirrors designed to work in the 7.5-11 nm wavelength range. Samples, prepared by magnetron sputtering, are deposited with or without B

Published
2018

2. Characterization of Pd/Y multilayers with B4C barrier layers using GIXR and X-ray standing wave enhanced HAXPES

Author

Vita Ilakovac, B. X. Li, Zhenhua Wang, Philippe Jonnard, Angelo Giglia, Qiushi Huang, Meiyi Wu, K. Le Guen, Jean-Pascal Rueff, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Institut de Chimie du CNRS (INC)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS), Tongji University, Université de Cergy Pontoise (UCP), Université Paris-Seine, Northwestern Polytechnical University [Xi'an] (NPU), CNR Istituto Officina dei Materiali (IOM), Consiglio Nazionale delle Ricerche [Roma] (CNR), Synchrotron SOLEIL (SSOLEIL), and Centre National de la Recherche Scientifique (CNRS)

Subjects
Nuclear and High Energy Physics, Materials science, Photoemission spectroscopy, Enthalpy, FOS: Physical sciences, Applied Physics (physics.app-ph), 02 engineering and technology, Photon energy, 01 natural sciences, Molecular physics, 010309 optics, Standing wave, Pd/Y, hard x-ray photoemission spectroscopy, x-ray standing waves, 0103 physical sciences, [CHIM]Chemical Sciences, Reflectometry, nanometric multilayers, Instrumentation, Radiation, X-ray standing waves, X-ray, Physics - Applied Physics, Sputter deposition, 021001 nanoscience & nanotechnology, 0210 nano-technology
Abstract

Pd/Y multilayers are high reflectance mirrors designed to work in the 7.5-11 nm wavelength range. Samples, prepared by magnetron sputtering, are deposited with or without B4C barrier layers located at the interfaces of Pd and Y layers to reduce interdiffusion, which is expected by calculating mixing enthalpy of Pd and Y. Grazing incident x-ray reflectometry is used to characterize these multilayers. B4C barrier layers are found effective on reducing the Pd-Y interdiffusion. Details of the composition of the multilayers are revealed by hard x-ray photoemission spectroscopy under x-ray standing waves effect. It consists in measuring the photoemission intensity from samples that perform an angular scan in the region corresponding to the multilayer period and the incident photon energy according to the Bragg law. The experimental result indicates that Pd does not chemically react with B nor C at the Pd-B4C interfaces while Y does at the Y-B4C interfaces. The formation of Y-B or Y-C chemical compound can be the reason why the interfaces are stabilized. By comparing the experimentally obtained angular variation of the characteristic photoemission with the theoretical calculation, the depth distribution of each component element can be interpreted., 13 pages, 8 figures, 1 tables, 19 references

Published
2018
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3. An etched multilayer as a dispersive element in a curved-crystal spectrometer: implementation and performance

Author

N. Isac, K. Le Guen, Philippe Jonnard, Jean-René Coudevylle, and Jean-Michel André

Subjects
010302 applied physics, Diffraction, Materials science, Fabrication, Spectrometer, business.industry, Physics::Optics, Grating, 01 natural sciences, 010309 optics, Chemical state, Wavelength, Optics, 0103 physical sciences, Emission spectrum, Spectral resolution, business, Spectroscopy
Abstract

Etched multilayers obtained by forming a laminar grating pattern within interferential multilayer mirrors are used in the soft X-ray range to improve the spectral resolution of wavelength dispersive spectrometers equipped with periodic multilayers. We describe the fabrication process of such an etched multilayer dispersive element, its characterization through reflectivity measurement and simulations, and its implementation in a high-resolution Johann-type spectrometer. The specially designed patterning of a Mo/B4C multilayer is found fruitful in the range of the C K emission as the diffraction pattern narrows by a factor 4 with respect to the non-etched structure. This dispersive element with an improved spectral resolution was successfully implemented for electronic structure study with an improved spectral resolution by X-ray emission spectroscopy. As first results, we present the distinction between the chemical states of carbon atoms in various compounds, such as graphite, SiC and B4C, by the different shape of their C K emission band. Copyright © 2012 John Wiley & Sons, Ltd.

Published
2012
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4. DUVEX: An X-ray counting system based on YAG:Ce scintillator

Author

Philippe Jonnard, K. Le Guen, Jean-Michel André, Yves Ménesguen, Laboratoire de Chimie Physique - Matière et Rayonnement ( LCPMR ), Université Pierre et Marie Curie - Paris 6 ( UPMC ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire National Henri Becquerel ( LNHB ), Département Métrologie Instrumentation & Information ( DM2I ), Laboratoire d'Intégration des Systèmes et des Technologies ( LIST ), Commissariat à l'énergie atomique et aux énergies alternatives ( CEA ) -Université Paris-Saclay-Commissariat à l'énergie atomique et aux énergies alternatives ( CEA ) -Université Paris-Saclay-Laboratoire d'Intégration des Systèmes et des Technologies ( LIST ), Commissariat à l'énergie atomique et aux énergies alternatives ( CEA ) -Université Paris-Saclay-Commissariat à l'énergie atomique et aux énergies alternatives ( CEA ) -Université Paris-Saclay, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Institut de Chimie du CNRS (INC)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS), Laboratoire National Henri Becquerel (LNHB), Département Métrologie Instrumentation & Information (DM2I), Laboratoire d'Intégration des Systèmes et des Technologies (LIST), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Laboratoire d'Intégration des Systèmes et des Technologies (LIST), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay, Laboratoire d'Intégration des Systèmes et des Technologies (LIST (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Laboratoire d'Intégration des Systèmes et des Technologies (LIST (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Département d'instrumentation Numérique (DIN (CEA-LIST)), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

Subjects
Nuclear and High Energy Physics, Photomultiplier, Physics::Instrumentation and Detectors, Astrophysics::High Energy Astrophysical Phenomena, Nuclear instrumentation, 02 engineering and technology, [PHYS.NEXP]Physics [physics]/Nuclear Experiment [nucl-ex], Scintillator, plastic scintillator, Noise (electronics), Spectral line, 030218 nuclear medicine & medical imaging, Counting system, 03 medical and health sciences, 0302 clinical medicine, Optics, sensor, ultraviolet, X-rays, [PHYS.PHYS.PHYS-INS-DET]Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det], [ PHYS.PHYS.PHYS-INS-DET ] Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det], Instrumentation, Physics, detector, Electronic architecture, Spectrometry, business.industry, Soft-x-ray, Detector, X-ray, Soft X-rays, 021001 nanoscience & nanotechnology, radioactivity, Extreme ultraviolet, Yield (chemistry), Optoelectronics, Extreme-UV, ionizing radiation, 0210 nano-technology, business
Abstract

10 pages; International audience; A detector system, called DUVEX, has been developed for the soft-x-ray and extreme ultraviolet domain. It consists of a YAG:Ce scintillator coupled to a photomultiplier module working under vacuum in counting mode. The design and the performances of this detector in terms of yield, absolute efficiency, response and noise are reported. Spectra in the soft x-ray range of different elements (W, Ag, Al, Mg, Cu, N, C and B) obtained in WDS mode using this detector are presented. DUVEX appears as a competitive detection tool in terms of cost and easiness of implementation.

Published
2011
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5. Molybdenum–silicon aperiodic multilayer broadband polarizer for 13–30nm wavelength range

Author

Philippe Jonnard, Lingyan Chen, M.Y. Tan, K. Le Guen, S. Nannarone, Nicola Mahne, A. Giglia, Zhanshan Wang, and Jingtao Zhu

Subjects
Physics, Nuclear and High Energy Physics, Silicon, business.industry, chemistry.chemical_element, Synchrotron radiation, Polarizer, Polarization (waves), Standard deviation, law.invention, Wavelength, Optics, chemistry, Molybdenum, law, Extreme ultraviolet, Optoelectronics, business, Instrumentation
Abstract

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband polarizer with reflectivity over a wide wavelength range of 13–30 nm at a fixed incidence angle of 45° was developed by a numerical method. The multilayer was prepared using direct current magnetron sputtering. The reflectivity and polarizing properties were characterized using synchrotron radiation. In 13–30 nm wavelength region, the measured s -reflectivity ( R s ) with standard deviation is 13.5%±3.1%, p -reflectivity ( R p ) with standard deviation is 1.4%±0.5%. The mean of polarization degree is 81.2%. This broadband multilayer polarizer can be used in extreme ultraviolet polarization measurements, and will greatly simplify experimental arrangements.

Published
2011
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6. Interfacial properties and characterization of Sc/Si multilayers

Author

Hélène Maury, Jean-Michel André, Philippe Jonnard, P. Ochin, K. Le Guen, Ernst Z. Kurmaev, Tyler N. Shendruk, and Alexander Moewes

Subjects
X-ray absorption spectroscopy, Materials science, Silicon, Absorption spectroscopy, Annealing (metallurgy), Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Sputter deposition, Atmospheric temperature range, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Silicide, Materials Chemistry, Scandium
Abstract

We investigate the intermixing of layers in Sc/Si and Sc/B 4 C/Si/B 4 C multilayers using electron and synchrotron excited soft X-ray emission and absorption spectroscopy. The multilayers are annealed at 100, 200, 300, 400 and 500 °C after preparation by magnetron sputtering. Silicon K β emission and reflectivity measurements verify that the non-annealed multilayer systems are composed of distinct layers with only a minor interdiffusion in Sc/Si samples whereas annealing Sc/Si multilayers at 400 °C leads to a degradation of the multilayer structure and the formation of intermittent scandium silicide, ScSi. The presence of B 4 C barriers in Sc/B 4 C/Si/B 4 C hinders this degradation from developing for the entire temperature range considered. The barrier layers continue to be effective for the entire temperature range even after an extended shelf-life.

Published
2010
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7. Thermal cycles, interface chemistry and optical performance of Mg/SiC multilayers

Author

Philippe Jonnard, Hélène Maury, Christophe Hecquet, Zhipeng Wang, Jingtao Zhu, Zhen Zhang, Stefano Nannarone, Franck Delmotte, Jean-Michel André, Françoise Bridou, Nicola Mahne, Angela Giglia, K. Le Guen, Jia Dong, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institute of Precision Optical Engineering [Shangai] (IPOE), Tongji University, Laboratoire Charles Fabry de l'Institut d'Optique / Scop, Laboratoire Charles Fabry de l'Institut d'Optique (LCFIO), Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11), Laboratorio Nazionale TASC (TASC), Consiglio Nazionale delle Ricerche (CNR), Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS), and National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR)

Subjects
Annealing (metallurgy), multilayers, Activation energy, Magnesium silicide, law.invention, chemistry.chemical_compound, Optics, law, x-ray emission, 68.65.Ac, 61.05.cm, 78.70.En, 73.90.+f, 66.30.Ny, 68.35.Fx, Silicon carbide, Crystallization, Thin film, Composite material, business.industry, Chemistry, [CHIM.MATE]Chemical Sciences/Material chemistry, Sputter deposition, Condensed Matter Physics, interface physics, Electronic, Optical and Magnetic Materials, X-ray reflectivity, mutilayer, [PHYS.COND.CM-GEN]Physics [physics]/Condensed Matter [cond-mat]/Other [cond-mat.other], x-ray reflectivity, interface, annealing, business
Abstract

16 pages; International audience; The interplay between optical performance and the thermally activated interface chemistry of periodic Mg/SiC multilayers designed for application at 30.4 nm are investigated by optical (hard x-ray, soft x-ray and ultraviolet ranges, i.e. from 0.154 to 30.4 nm) reflectivity and x-ray emission spectroscopy. The multilayers are prepared by magnetron sputtering and then annealed up to a temperature of 500°C. Two clear changes take place in the multilayer upon annealing. At first, between 200 and 300°C a strong decrease of the reflectivity is observed, due to the development of interfacial roughness following the crystallization of the Mg layers. No interfacial compound is detected. Then, between 350 and 400°C there is formation of the Mg2Si magnesium silicide at the interfaces following the reaction between the Mg and SiC layers. This also leads to the almost total loss of reflectivity of the multilayer. Thus, this kind of multilayer is thermally stable only for application requiring no heating above 200°C.

Published
2008
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8. X-ray interface analysis of aperiodic Mo/Si multilayers

Author

J.-M. André, H. Maury, Philippe Jonnard, Huanwen Wang, Zhipeng Wang, K. Le Guen, and Jingtao Zhu

Subjects
Amorphous silicon, Materials science, Valence (chemistry), Silicon, Analytical chemistry, X-ray, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, Crystallography, chemistry.chemical_compound, chemistry, Transition metal, Molybdenum, Silicide, Emission spectrum
Abstract

We present the non-destructive analysis of aperiodic Mo/Si multilayers by X-ray emission spectroscopy induced by electrons. The Si 3p occupied valence states of the silicon atoms present within these structures are analysed. Because of the great sensitivity of these states to the physico-chemical environment of the Si atoms, it is possible to distinguish the emission from the center of the Si layer (amorphous silicon) to that of the interfacial zones between the Mo and Si layers. Thus, the presence of molybdenum silicides is evidenced in the interfacial zones. It is also shown that the relative proportion of interfacial silicides depends on the deposition conditions.

Published
2007
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9. Development of a four-element conical electron lens dedicated to high resolution Auger electron–ion(s) coincidence experiments

Author

Catalin Miron, F. Burmeister, Denis Céolin, A. Naves de Brito, Stacey L. Sorensen, Alexandra Mocellin, R. Guillemin, M. Bougeard, Pascal Morin, N. Leclercq, K. Le Guen, Mario Simon, Laboratoire Francis PERRIN (LFP - URA 2453), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), Laboratoire pour l'utilisation du rayonnement électromagnétique (LURE), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-MENRT-Centre National de la Recherche Scientifique (CNRS), Department of Chemistry, University of Nevada [Reno], Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Department of Physics, Uppsala University, Department of Synchrotron Radiation Research, University of Lund-Czech Academy of Sciences [Prague] (CAS), and Lund University [Lund]-Czech Academy of Sciences [Prague] (CAS)

Subjects
numerical analysis, electrostatic lenses, Synchrotron radiation, Electron, 01 natural sciences, Electron spectroscopy, electron lenses, law.invention, Auger, electron optics, Optics, law, 0103 physical sciences, 010306 general physics, Instrumentation, Electrostatic lens, Physics, Auger electron spectroscopy, 010304 chemical physics, synchrotron radiation, business.industry, physics computing, [CHIM.THEO]Chemical Sciences/Theoretical and/or physical chemistry, Lens (optics), Electron optics, PACS: 41.85.Ne, 07.81.+a, 07.85.Qe, 41.60.Ap, 79.20.Fv, 02.60.Cb, business
Abstract

A four-element conical electron lens has been developed in view of its integration to a double toroidal electron energy analyzer (DTA) dedicated to Auger electron–ion coincidence measurements. The lens design, using electron trajectory numerical simulations, was entirely guided by the perspective of analyzing energetic electrons with high resolution in the multicoincidence regime. The design, construction, and experimental characterization stages of this electron optics system are described in this article. Emphasis is put on the importance of third generation synchrotron radiation sources when performing such multicoincidence experiments.

Published
2002
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10. On the Kramers-Kronig transform with logarithmic kernel for the reflection phase in the Drude model

Author

N. Mahne, S. Nannarone, Philippe Jonnard, K. Le Guen, Jean-Michel André, Angela Giglia, Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratorio Nazionale TASC (TASC), Consiglio Nazionale delle Ricerche (CNR), and National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR)

Subjects
optical properties, Karush–Kuhn–Tucker conditions, Kramers–Kronig relations, Logarithm, reflectance, Synchrotron radiation, FOS: Physical sciences, Physics::Optics, 02 engineering and technology, Dielectric, 01 natural sciences, 0103 physical sciences, Kramers-Kronig analysis, 010306 general physics, Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Drude model, Mathematical analysis, 16. Peace & justice, 021001 nanoscience & nanotechnology, Atomic and Molecular Physics, and Optics, Kernel (image processing), thin films, 0210 nano-technology, Refractive index, Physics - Optics, Optics (physics.optics)
Abstract

We use the Kramers-Kronig transform (KKT) with logarithmic kernel to obtain the reflection phase and, subsequently, the complex refractive index of a bulk mirror from reflectance. However, there remains some confusion regarding the formulation for this analysis. Assuming the damped Drude model for the dielectric constant and the oblique incidence case, we calculate the additional terms: phase at zero frequency and Blashke factor and we propose a reformulated KKT within this model. Absolute reflectance in the s-polarization case of a gold film is measured between 40 and 350 eV for various glancing angles using synchrotron radiation and its complex refractive index is deduced using the reformulated KKT that we propose. The results are discussed with respect to the data available in the literature., Comment: 18 pages, piblished in j. Mod. Opt. 57, 1504 (2010)

Published
2010
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11. Observation of an asymmetrical effect when introducing Zr in Mg/Co multilayers

Author

S.-K. Zhou, Christian Meny, M.-H. Hu, Jean-Michel André, H. Ch. Li, Philippe Jonnard, K. Le Guen, Jingtao Zhu, Anouk Galtayries, Z. S. Wang, Laboratoire de Chimie Physique - Matière et Rayonnement ( LCPMR ), Université Pierre et Marie Curie - Paris 6 ( UPMC ) -Centre National de la Recherche Scientifique ( CNRS ), Institute of Precision Optical Engineering ( IPOE ), Institut de Physique et Chimie des Matériaux de Strasbourg ( IPCMS ), Université de Strasbourg ( UNISTRA ) -Centre National de la Recherche Scientifique ( CNRS ) -Matériaux et nanosciences d'Alsace, Université de Strasbourg ( UNISTRA ) -Université de Haute-Alsace (UHA) Mulhouse - Colmar ( Université de Haute-Alsace (UHA) ) -Institut National de la Santé et de la Recherche Médicale ( INSERM ) -Centre National de la Recherche Scientifique ( CNRS ) -Université de Strasbourg ( UNISTRA ) -Université de Haute-Alsace (UHA) Mulhouse - Colmar ( Université de Haute-Alsace (UHA) ) -Institut National de la Santé et de la Recherche Médicale ( INSERM ) -Centre National de la Recherche Scientifique ( CNRS ) -Réseau nanophotonique et optique, Université de Strasbourg ( UNISTRA ) -Université de Haute-Alsace (UHA) Mulhouse - Colmar ( Université de Haute-Alsace (UHA) ) -Centre National de la Recherche Scientifique ( CNRS ) -Université de Strasbourg ( UNISTRA ), Laboratoire de Physico-Chimie des Surfaces ( LPCS ), Centre National de la Recherche Scientifique ( CNRS ), Laboratoire de Chimie Physique - Matière et Rayonnement (LCPMR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institute of Precision Optical Engineering [Shangai] (IPOE), Tongji University, Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), Université de Strasbourg (UNISTRA)-Centre National de la Recherche Scientifique (CNRS)-Matériaux et nanosciences d'Alsace (FMNGE), Institut de Chimie du CNRS (INC)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Centre National de la Recherche Scientifique (CNRS)-Réseau nanophotonique et optique, Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA), Laboratoire de Physico-Chimie des Surfaces (LPCS), Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Strasbourg (UNISTRA)-Centre National de la Recherche Scientifique (CNRS)-Matériaux et Nanosciences Grand-Est (MNGE), Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Réseau nanophotonique et optique, and Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Centre National de la Recherche Scientifique (CNRS)

Subjects
Materials science, Physics and Astronomy (miscellaneous), Period (periodic table), Optical contrast, Superlattice, Aucun, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, 01 natural sciences, 010309 optics, 0103 physical sciences, Zirconium, multilayer, Magnesium, [CHIM.MATE]Chemical Sciences/Material chemistry, [ PHYS.COND.CM-GEN ] Physics [physics]/Condensed Matter [cond-mat]/Other [cond-mat.other], 021001 nanoscience & nanotechnology, Reflectivity, Secondary ion mass spectrometry, Crystallography, chemistry, [PHYS.COND.CM-GEN]Physics [physics]/Condensed Matter [cond-mat]/Other [cond-mat.other], [ CHIM.MATE ] Chemical Sciences/Material chemistry, interface, 0210 nano-technology, Cobalt
Abstract

We have developed Mg/Co, Mg/Zr/Co, Mg/Co/Zr, and Mg/Zr/Co/Zr periodic multilayers and measured at 25.1 nm a reflectivity (R) highly sensitive to the material order within the period. To understand why Mg/Co/Zr is a more efficient mirror (R=50%) than Mg/Zr/Co and Mg/Zr/Co/Zr (similar to 40%), we have probed the interface quality through time-of-flight secondary ion mass spectrometry and nuclear magnetic resonance measurements. The Zr-on-Co interface is found quite sharp while a strong intermixing process is evidenced between the upper Co and lower Zr layers, responsible for the decrease in optical contrast and subsequent R loss. (C) 2011 American Institute of Physics. [doi:10.1063/1.3601859]

Published
2011
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14. Spectroscopic study of interfaces in Al/Ni periodic multilayers.

Author

K. Le Guen, G. Gamblin, P. Jonnard, M. Salou, J. Ben Youssef, S. Rioual, and B. Rouvellou

Abstract

Using electron-induced X-ray emission spectroscopy (XES), we have studied two Al/Ni periodic multilayers that differ only by their annealing temperature: as-deposited and annealed at 115??C. Our aim is to show that XES can provide further details about the chemistry at the metal-metal interface, in addition to what is obtained by X-ray diffraction. The distribution of valence states exhibiting Al 3p and Ni 3d character is determined from the analysis of the AlK? and NiL? emission bands respectively. The multilayer emission bands are compared to those of reference materials: pure Al and Ni metals as well as Al3Ni, Al3Ni2and AlNi intermetallics. We provide evidence that, for temperatures up to 115??C, Al3Ni is the major component of the multilayer. [ABSTRACT FROM AUTHOR]

Published
2009
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