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Channel electron multiplier (CEM) and microchannel plate (MCP) detectors are routinely used in space instrumentation for measurement of space plasmas. Our goal is to understand the relative sensitivities of these detectors to penetrating radiation in space, which can generate background counts and shorten detector lifetime. We use $662~\hbox{keV} \, \gamma $ -rays as a proxy for penetrating radiation such as $\gamma $ -rays, cosmic rays, and high-energy electrons and protons that are ubiquitous in the space environment. We find that MCP detectors are $\sim 20$ times more sensitive to $662~\hbox{keV} \, \gamma $ -rays than CEM detectors. This is attributed to the larger total area of multiplication channels in an MCP detector that is sensitive to electronic excitation and ionization resulting from the interaction of penetrating radiation with the detector material. In contrast to the CEM detector, whose quantum efficiency ${\varepsilon _\gamma} $ for $662~\hbox{keV} \, \gamma $ -rays is found to be 0.00175 and largely independent of detector bias, the quantum efficiency of the MCP detector is strongly dependent on the detector bias, with a power law index of 5.5. Background counts in MCP detectors from penetrating radiation can be reduced using MCP geometries with higher pitch and smaller channel diameter.

We measure the response of silicon photodiodes to irradiation by H/sup +/, He/sup +/, C/sup +/, N/sup +/, O/sup +/, Ne/sup +/, and Ar/sup +/ ions with energies up to 60 keV. The unique properties of these photodiodes, including an ultrathin SiO/sub 2/ dead layer and 100% internal carrier collection efficiency, allow direct measurement of the total energy lost to nuclear (nonionizing) and electronic (ionizing) energy loss processes, which are important for quantifying effects such as damage and charge deposition. When plotted as a function of E/mZ/sup 1/2/, where E, m, and Z are the incident ion energy, mass, and atomic number, respectively, the responsivity is found to follow a single curve that represents all ion species and energies used in this study. This enables rapid, accurate estimation of damage and charge deposition by an ion as a function of penetration depth in silicon. A comparison of the measurements with the stopping and range of ions in matter (SRIM) Monte Carlo simulation code shows that SRIM significantly overestimates the fraction of the incident energy lost to electronic stopping processes for E/mZ/sup 1/2/

Electron irradiation of 100% internal quantum efficiency silicon photodiodes having a thin (60 /spl Aring/) SiO/sub 2/ dead layer results in measured responsivities ranging from 0.056 A/W at an incident electron energy E/sub 0/=0.2 keV to 0.24 A/W at E/sub 0/=40 keV. By comparing the data to a Monte Carlo simulation of electron interactions with the photodiode over an energy range of 1-40 keV, we derive an average electron-hole pair creation energy of 3.71 eV, in close agreement with other studies. Analysis of electron energy lost to processes that do not contribute to electron-hole pair creation shows that the energy lost in the SiO/sub 2/ dead layer is dominant for E/sub 0/ 1.5 keV. At E/sub 0/=300 eV, the Monte Carlo simulation results show that the electron projected range is significantly less than the dead layer thickness even though the measured response is 0.082 A/W, indicating that electron-hole pairs generated in the oxide dead layer are collected by the junction.

Recent advances in solid-state detector (SSD) technology have demonstrated the detection of ions and electrons down to 1 keV. However, ions at keV energies lose a substantial amount of energy ΔN in a SSD through Coulombic interactions with target nuclei rather than through interactions that contribute to the SSD output pulse, whose magnitude is a measure of the ion’s incident energy. Because ΔN depends on the ion species, detector material, and interaction physics, it represents a fundamental limitation of the output pulse magnitude of the detector. Using 100% quantum collection efficiency silicon photodiodes with a thin (40–60 A) SiO2 passivation layer, we accurately quantify ΔN for incident 1–120 keV ions and, therefore, evaluate the detection limits of keV ions using silicon detectors.

Ultraviolet (UV) blocking filters are needed for atomic flux imaging in environments where high levels of ultraviolet radiation are present. Freestanding gratings are a promising candidate for UV filtering. They have a high aspect ratio (∼13), narrow (∼40 nm) slots, and effectively block UV radiation. The grating fabrication process makes use of several etching, electroplating, and lithographic steps and includes an optional step to plug pinholes induced by particles during processing. Gratings were successfully manufactured and tested. Measured UV transmissions of ∼10−5 and particle transmissions of ∼10% are in agreement with theoretical predictions.