1. Multi-level nanoimprint lithography for large-area thin film transistor backplane manufacturing
- Author
-
Gerwin H. Gelinck, Auke Jisk Kronemeijer, Roy Verbeek, Thijs Bel, Ilias Katsouras, Tamer Dogan, Joris de Riet, Eric Meulenkamp, Applied Physics and Science Education, and Molecular Materials and Nanosystems
- Subjects
Materials science ,Polymers and Plastics ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,Nanoimprint lithography ,law.invention ,law ,AMOLED ,Materials Chemistry ,A-IGZO TFT ,Multi-level nanoimprint lithography ,business.industry ,Organic Chemistry ,021001 nanoscience & nanotechnology ,Hybrid approach ,0104 chemical sciences ,Backplane ,Thin-film transistor ,Benchmark (computing) ,Optoelectronics ,Photolithography ,0210 nano-technology ,business ,Realization (systems) - Abstract
Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next-generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.
- Published
- 2020