1. MD simulation study on defect evolution and doping efficiency of p-type doping of 3C-SiC by Al ion implantation with subsequent annealing
- Author
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Alexander Hartmaier, Jintong Wu, Zongwei Xu, Lei Liu, Mathias Rommel, Tao Wang, Junlei Zhao, Kai Nordlund, Rebecca Janisch, Department of Physics, Helsinki Institute of Sustainability Science (HELSUS), Helsinki Institute of Urban and Regional Studies (Urbaria), and Publica
- Subjects
structural phase transition ,Materials science ,Recrystallization (geology) ,Annealing (metallurgy) ,chemistry.chemical_element ,recrystallization (metallurgy) ,02 engineering and technology ,Molecular dynamics ,Stopping power ,electronic stopping power ,114 Physical sciences ,01 natural sciences ,chemistry.chemical_compound ,silicon carbide ,Aluminium ,0103 physical sciences ,Materials Chemistry ,Silicon carbide ,ion implantation ,recrystallization process ,010302 applied physics ,Condensed matter physics ,implantation-induced defects ,aluminium ,Doping ,molecular dynamics simulations ,General Chemistry ,021001 nanoscience & nanotechnology ,numerical characterisation ,surface recrystallization ,Ion implantation ,chemistry ,efficiency ,annealing ,atomic-scale mechanisms ,crystal atomic structure ,0210 nano-technology - Abstract
We use molecular dynamics (MD) simulation with numerical characterisation and statistical analysis to study the mechanisms of damage evolution and p-type doping efficiency by aluminum (Al) ion implantation into 3C silicon carbide (SiC) with subsequent annealing. By incorporating the electronic stopping power for implantation, a more accurate description of the atomic-scale mechanisms of damage evolution and distribution in SiC can be obtained. The simulation results show a novel observation that the recrystallization process occurs in the region below the subsurface layer, and develops from amorphous-crystalline interface to the damage center region, which is a new insight into previously published studies. During surface recrystallization, significant compressive stress concentration occurs, and more structural phase transition atoms and dislocations formed at the damage-rich-crystalline interface. Another point of interest is that for low-dose implantation, more implantation-induced defects hamper the doping efficiency. Correspondingly, the correlation between lattice damage and doping efficiency becomes weaker as the implant dose increases under the same annealing conditions. Our simulation also predicts that annealing after high temperature (HT) implantation is more likely to lead to the formation of carbon vacancies (V-C).
- Published
- 2021
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