1. Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells
- Author
-
Lu, Wei-Lun, Huang, Kuo-Chan, Hung, Pin-Kun, and Houng, Mau-Phon
- Subjects
- *
ZINC oxide , *ALUMINUM , *ELECTRIC properties of thin films , *OPTICAL properties , *SILICON compounds , *SOLAR cells - Abstract
Abstract: The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 75–80% as measured by a UV–vis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved. [Copyright &y& Elsevier]
- Published
- 2012
- Full Text
- View/download PDF