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The optical properties of Al 0.1 Ga 0.9 N nanostructures grown by molecular beam epitaxy on Al 0.5 Ga 0.5 N (0001) templates are investigated. By combining morphological and photoluminescence (PL) characterizations, we have performed an in-depth analysis of the nanostructures properties as a function of the deposited amount. It is shown that: 1) the nanostructures present an asymmetrical height distribution, and a variation in their shape (i.e. both symmetric and elongated nanostructures are observed); 2) the main PL emission is found in the UV range (above 3.6 eV); and 3) a broad emission in the near UV-blue range is observed. These results allowed to attribute the main PL peak to nanostructures with properties in close agreement to the nominal Al 0.1 Ga 0.9 N concentration and deposited amount. Concerning the broad PL band at lower energy, it has been correlated to the formation of an additional type of nanostructures with larger size and lower Al composition compared to the Al 0.1 Ga 0.9 N ones. [ABSTRACT FROM AUTHOR]

Aluminium Gallium Nitride (AlyGa1-yN) quantum dots (QDs) with thin sub-µm AlxGa1-xN layers (with x > y) were grown by molecular beam epitaxy on 3 nm and 6 nm thick hexagonal boron nitride (h-BN) initially deposited on c-sapphire substrates. An AlN layer was grown on h-BN and the surface roughness was investigated by atomic force microscopy for different deposited thicknesses. It was shown that for thicker AlN layers (i.e., 200 nm), the surface roughness can be reduced and hence a better surface morphology is obtained. Next, AlyGa1-yN QDs embedded in Al0.7Ga0.3N cladding layers were grown on the AlN and investigated by atomic force microscopy. Furthermore, X-ray diffraction measurements were conducted to assess the crystalline quality of the AlGaN/AlN layers and examine the impact of h-BN on the subsequent layers. Next, the QDs emission properties were studied by photoluminescence and an emission in the deep ultra-violet, i.e., in the 275–280 nm range was obtained at room temperature. Finally, temperature-dependent photoluminescence was performed. A limited decrease in the emission intensity of the QDs with increasing temperatures was observed as a result of the three-dimensional confinement of carriers in the QDs. [ABSTRACT FROM AUTHOR]

In this paper, we report on the fabrication of a normally-off Al(Ga)N/GaN high electron mobility transistor with selective area sublimation under vacuum of the p type doped GaN cap layer. This soft method makes it possible to avoid damages otherwise induced by post processing with reactive ion etching techniques. The GaN evaporation selectivity is demonstrated on AlN as well as on AlGaN barrier layers. Furthermore, by properly choosing the AlGaN barrier thickness and composition it is possible to co-integrate a normally-off with a normally-on device on the same substrate. Finally, a local area regrowth of AlGaN can complement this process to increase the maximum drain current in the transistors. [ABSTRACT FROM AUTHOR]