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The metal–organic framework (MOF), NU-1000, and its metalated counterparts have found proof-of-concept application in heterogeneous catalysis and hydrogen storage among others. A vapor-phase technique, akin to atomic layer deposition (ALD), is used to selectively deposit divalent Cu ions on oxo, hydroxo-bridged hexa-zirconium(IV) nodes capped with terminal –OH and –OH2 ligands. The subsequent reaction with steam yields node-anchored, CuII-oxo, hydroxo clusters. We find that cluster installation via AIM (ALD in MOFs) is accompanied by an expansion of the MOF mesopore (channel) diameter. We investigated the behavior of the cluster-modified material, termed Cu-AIM-NU-1000, to heat treatment up to 325 °C at atmospheric pressure with a low flow of H2 into the reaction cell. The response under these conditions revealed two important results: (1) Above 200 °C, the initially installed few-metal-ion clusters reduce to neutral Cu atoms. The neutral atoms migrate from the nodes and aggregate into Cu nanoparticles. While the size of particles formed in the MOF interior is constrained by the width of mesopores (∼3 nm), the size of those formed on the exterior surface of the MOF can grow as large as ∼8 nm. (2) Reduction and release of Cu atoms from the MOFs nodes is accompanied by the dynamic structural transformation of NU-1000 as it reverts back to its original dimension following the release. These results show that while the MOF framework itself remains intact at 325 °C in an H2 atmosphere, the small, AIM-installed CuII-oxo, hydroxo clusters are stable with respect to reduction and conversion to metallic nanoparticles only up to ∼200 °C. [ABSTRACT FROM AUTHOR]

Abstract: Single atoms and few‐atom clusters of platinum are uniformly installed on the zirconia nodes of a metal‐organic framework (MOF) NU‐1000 via targeted vapor‐phase synthesis. The catalytic Pt clusters, site‐isolated by organic linkers, are shown to exhibit high catalytic activity for ethylene hydrogenation while exhibiting resistance to sintering up to 200 °C. In situ IR spectroscopy reveals the presence of both single atoms and few‐atom clusters that depend upon synthesis conditions. Operando X‐ray absorption spectroscopy and X‐ray pair distribution analyses reveal unique changes in chemical bonding environment and cluster size stability while on stream. Density functional theory calculations elucidate a favorable reaction pathway for ethylene hydrogenation with the novel catalyst. These results provide evidence that atomic layer deposition (ALD) in MOFs is a versatile approach to the rational synthesis of size‐selected clusters, including noble metals, on a high surface area support. [ABSTRACT FROM AUTHOR]

Post-synthetic modification of the zirconium-based metal-organic framework (MOF) NU-1000 by atomic layer deposition (ALD), using tetramethoxysilane (Si(OMe)4) as a precursor, led to the incorporation and stabilization of silicon oxide clusters composed of only a few silicon atoms in the framework's pores. The resulting SiO x functionalized material (Si-NU-1000) was found to be catalytically active despite the inactivity of related bulk silicon dioxide (SiO2), thus demonstrating the positive effects of having nanosized clusters of SiO x. Moreover, Si-NU-1000 showed activity greater than that found for aluminum oxide based catalysts-oxides known for their high acidity-such as an aluminum oxide functionalized MOF (Al-NU-1000) and bulk γ-Al2O3. X-ray photoelectron spectroscopy and infrared spectroscopy measurements unmasked the electron donating nature of Si-NU-1000, explaining the unusual electronic properties of the nanosized SiO x clusters and supporting their high catalytic activity. [ABSTRACT FROM AUTHOR]

Abstract Atomic layer deposition (ALD) has been used to apply continuous Pt films on powders of the solid acid CsH 2 PO 4 (CDP), in turn, used in the preparation of cathodes in solid acid fuel cells (SAFCs). The film deposition was carried out at 150 °C using trimethyl(methylcyclopentadienyl)platinum (MeCpPtMe 3) as the Pt source and ozone as the reactant for ligand removal. Chemical analysis showed a Pt growth rate of 0.09 ± 0.01 wt%/cycle subsequent to an initial nucleation delay of 84 ± 20 cycles. Electron microscopy revealed the contiguous nature of the films prepared using 200 or more cycles. The cathode overpotential (0.48 ± 0.02 V at a current density of 200 mA/cm2) was independent of Pt deposition amount beyond the minimum required to achieve these continuous films. The cell electrochemical characteristics were moreover extremely stable with time, with the cathode overpotentials increasing by no more than 10 mV over a 100 h period of measurement. Thus, ALD holds promise as an effective tool in the preparation of SAFC cathodes with high activity and excellent stability. Graphical abstract Image 1 [ABSTRACT FROM AUTHOR]

The prospect of using copper oxide nanoclusters grown by atomic layer deposition on a porphyrin support for selective oxidation of methane to methanol was examined by means of density functional theory (DFT) calculations. Ab initio thermodynamic analysis indicates that an active site in the form of Cu(μ-O)Cu can be stabilized by activation in O 2 at 465 K. Furthermore, a moderate methane activation energy barrier (E a  = 54 kJ/mol) is predicted, and the hydrogen abstraction activity of the active site could be attributed to the radical character of the bridging oxygen. Methanol extraction in this system is limited by a thermodynamic barrier to desorption of ΔG = 57 kJ/mol at 473 K; however, desorption can be facilitated by the addition of water in a “stepped conversion” process. Overall, our results indicate similar activity between porphyrin-supported copper oxide nanoclusters and existing Cu-exchanged zeolites and provide a computational proof-of-concept for utilizing functionalized organic linkers in metal-organic frameworks (MOFs) for selective oxidation of methane to methanol. [ABSTRACT FROM AUTHOR]

Often key to boosting photovoltages in photoelectrochemical and related solar-energy-conversion devices is the preferential slowing of rates of charge recombination, especially recombination at semiconductor/solution, semiconductor/polymer, or semiconductor/perovskite interfaces. In devices featuring TiO2 as the semiconducting component, a common approach to slowing recombination is to install an ultrathin metal oxide barrier layer or trap-passivating layer atop the semiconductor, with the needed layer often being formed via atomic layer deposition (ALD). A particularly promising barrier layer material is Nb2O5. Its conduction-band-edge potential ECB is low enough that charge injection from an adsorbed molecular, polymeric, or solid-state light absorber and into the semiconductor can still occur, but high enough that charge recombination is inhibited. While a few measurements of ECB have been reported for conventionally synthesized, bulk Nb2O5, none have been described for ALD-fabricated versions. Here, we specifically determine the conduction-band-edge energy of ALD-fabricated Nb2O5 relative to that of TiO2. We find that, while the value for ALD-Nb2O5 is indeed higher than that for TiO2, the difference is less than anticipated based on measurements of conventionally synthesized Nb2O5 and is dependent on the thermal history of the material. The implications of the findings for optimization of competing interfacial rate processes, and therefore photovoltages, are briefly discussed. [ABSTRACT FROM AUTHOR]

NU-1000, a zirconium-based metal-organic framework (MOF) featuring mesoporous channels, has been postsynthetically metalated via atomic layer deposition in a MOF (AIM) employing dimethylaluminum iso-propoxide ([AlMe2OiPr]2, DMAI), a milder precursor than widely used trimethylaluminum (AlMe3, TMA). The aluminum-modified NU-1000 (Al-NU-1000) has been characterized with a comprehensive suite of techniques that points to the formation of aluminum oxide clusters well dispersed through the framework and stabilized by confinement within small pores intrinsic to the NU-1000 structure. Experimental evidence allows for identification of spectroscopic similarities between Al-NU-1000 and γ-Al2O3. Density functional theory modeling provides structures and simulated spectra, the relevance of which can be assessed via comparison to experimental IR and EXAFS data. The catalytic performance of Al-NU-1000 has been benchmarked against γ-Al2O3, with promising results in terms of selectivity. [ABSTRACT FROM AUTHOR]

Despite rapid advances in conversion efficiency (>22%), the environmental stability of perovskite solar cells remains a substantial barrier to commercialization. Here, we show a significant improvement in the stability of inverted perovskite solar cells against liquid water and high operating temperature (100 °C) by integrating an ultrathin amorphous oxide electron extraction layer via atomic layer deposition (ALD). These unencapsulated inverted devices exhibit a stable operation over at least 10 h when subjected to high thermal stress (100 °C) in ambient environments, as well as upon direct contact with a droplet of water without further encapsulation. [ABSTRACT FROM AUTHOR]

Transition metal sulfides show great promise for applications ranging from catalysis to electrocatalysis to photovoltaics due to their high stability and conductivity. Nickel sulfide, particularly known for its ability to electrochemically reduce protons to hydrogen gas nearly as efficiently as expensive noble metals, can be challenging to produce with certain surface site compositions or morphologies, e.g., conformal thin films. To this end, we employed atomic layer deposition (ALD), a preeminent method to fabricate uniform and conformal films, to construct thin films of nickel sulfide (NiSx) using bis(N,N'-di-tert-butylacetamidinato)nickel(II) (Ni(amd)2) vapor and hydrogen sulfide gas. Effects of experimental conditions such as pulse and purge times and temperature on the growth of NiSx were investigated. These revealed a wide temperature range, 125-225 °C, over which self-limiting NiSx growth can be observed. In situ quartz crystal microbalance (QCM) studies revealed conventional linear growth behavior for NiSx films, with a growth rate of 9.3 ng/cm2 per cycle being obtained. The ALD-synthesized films were characterized using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) methods. To assess the electrocatalyitic activity of NiSx for evolution of molecular hydrogen, films were grown on conductive-glass supports. Overpotentials at a current density of 10 mA/cm2 were recorded in both acidic and pH 7 phosphate buffer aqueous reaction media and found to be 440 and 576 mV, respectively, with very low NiSx loading. These results hint at the promise of ALD-grown NiSx materials as water-compatible electrocatalysts. [ABSTRACT FROM AUTHOR]

The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MOFs present new challenges. Through in situ synchrotron X-ray powder diffraction, we visualize how the deposited atoms are localized and redistribute within the MOF during ALD. We demonstrate that the ALD is regioselective, with preferential deposition of oxy-Zn(II) species within the small pores of NU-1000. Complementary density functional calculations indicate that this startling regioselectivity is driven by dispersion interactions associated with the preferential adsorption sites for the organometallic precursors prior to reaction. [ABSTRACT FROM AUTHOR]

The combination (AIM-ME) of atomic layer deposition in metal-organic frameworks (MOFs) and metal exchange (ME) is introduced as a technique to install dispersed metal atoms into the mesoporous MOF, NU-1000. Zn-AIM, which contains four Zn atoms per Zr6 node, has been synthesized through AIM and further characterized through density functional calculations to provide insight into the possible structure. Zn-AIM was then subjected to modification via transmetalation to yield uniform porous materials that present nonstructural Cu, Co, or Ni atoms. [ABSTRACT FROM AUTHOR]

Developing supported single-site catalysts is an important goal in heterogeneous catalysis since the well-defined active sites afford opportunities for detailed mechanistic studies, thereby facilitating the design of improved catalysts. We present herein a method for installing Ni ions uniformly and precisely on the node of a Zr-based metal-organic framework (MOF), NU-1000, in high density and large quantity (denoted as Ni-AIM) using atomic layer deposition (ALD) in a MOF (AIM). Ni-AIM is demonstrated to be an efficient gas-phase hydrogenation catalyst upon activation. The structure of the active sites in Ni-AIM is proposed, revealing its single-site nature. More importantly, due to the organic linker used to construct the MOF support, the Ni ions stay isolated throughout the hydrogenation catalysis, in accord with its long-term stability. A quantum chemical characterization of the catalyst and the catalytic process complements the experimental results. With validation of computational modeling protocols, we further targeted ethylene oligomerization catalysis by Ni-AIM guided by theoretical prediction. Given the generality of the AIM methodology, this emerging class of materials should prove ripe for the discovery of new catalysts for the transformation of volatile substrates. [ABSTRACT FROM AUTHOR]

Postsynthetic functionalization ofmetal organic frameworks (MOFs)enables the controlled, high-density incorporation of new atoms ona crystallographically precise framework. Leveraging the broad paletteof known atomic layer deposition (ALD) chemistries, ALD in MOFs (AIM) isone such targeted approach to construct diverse, highly functional,few-atom clusters. We here demonstrate the saturating reaction oftrimethylindium (InMe3) with the node hydroxyls and ligatedwater of NU-1000, which takes place without significant loss of MOFcrystallinity or internal surface area. We computationally identifythe elementary steps by which trimethylated trivalent metal compounds(ALD precursors) react with this Zr-based MOF node to generate a uniformand well characterized new surface layer on the node itself, and wepredict a final structure that is fully consistent with experimentalX-ray pair distribution function (PDF) analysis. We further demonstratetunable metal loading through controlled number density of the reactivehandles (−OH and −OH2) achieved through nodedehydration at elevated temperatures. [ABSTRACT FROM AUTHOR]

Ultrathin films of TiO2, ZrO2, and Al2O3 were conformally created on SnO2 and TiO2 photoelectrodes via atomic layer deposition (ALD) to examine their influence upon electron transfer (ET) from the electrodes to a representative molecular receptor, I3-. Films thicker than 2 Å engender an exponential decrease in ET time with increasing film thickness, consistent with tunneling theory. Increasing the height of the barrier, as measured by the energy difference between the transferring electron and the bottom of the conduction band of the barrier material, results in steeper exponential drops in tunneling rate or probability. The variations are quantitatively consistent with a simple model of quantum tunneling of electrons through square barriers (i.e., barriers of individually uniform energy height) that are characterized by individually uniform physical thickness. The findings demonstrate that ALD is a remarkably uniform and precise method for modifying electrode surfaces and imply that standard tunneling theory can be used as a quantitative guide to intentionally and predictively modulating rates of ET between molecules and electrodes. [ABSTRACT FROM AUTHOR]

Detachment (desorption) of molecular dyes from photoelectrodes is one of the major limitations for the long-term operation of dye-sensitized solar cells. Here we demonstrate a method to greatly inhibit this loss by growing a transparent metal oxide (TiO2) on the dye-coated photoelectrode via atomic layer deposition (ALD). TiO2-enshrouded sensitizers largely resist detachment, even in pH 10.7 ethanol, a standard solution for intentional removal of molecular dyes from photoelectrodes. Additionally, the ALD post-treatment renders the otherwise hydrophobic dye-coated surface hydrophilic, thereby enhancing photoelectrode pore-filling with aqueous solution. [ABSTRACT FROM AUTHOR]

Metal–organic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by ALD In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOF with spatially oriented −OH groups and large 1D mesopores and apertures. [ABSTRACT FROM AUTHOR]

Both the adsorption of t-butylpyridineand theatomic-layer deposition of ultrathin conformal coatings of insulators(such as alumina) are known to boost open-circuit photovoltages substantiallyfor dye-sensitized solar cells. One attractive interpretation is thatthese modifiers significantly shift the conduction-edge energy ofthe electrode, thereby shifting the onset potential for dark currentarising from the interception of injected electrons by solution-phaseredox shuttle components such as Co(phenanthroline)33+and triiodide. For standard, high-area, nanoporous photoelectrodes,band-edge energies are difficult to measure directly. In contrast,for flat electrodes they are readily accessible from Mott–Schottkyanalyses of impedance data. Using such electrodes (specifically TiO2), we find that neither organic nor inorganic electrode-surfacemodifiers shift the conduction-band-edge energy sufficiently to accountfully for the beneficial effects on electrode behavior (i.e., thesuppression of dark current). Additional experiments reveal that theefficacy of ultrathin coatings of Al2O3ariseschiefly from the passivation of redox-catalytic surface states. Incontrast, adsorbed t-butylpyridine appears to suppressdark currents mainly by physically blocking access of shuttle moleculesto the electrode surface. Studies with other derivatives of pyridine,including sterically and/or electronically diverse derivatives, showthat heterocycle adsorption and the concomitant suppression of darkcurrent does not require the coordination of surface Ti(IV) or Al(III)atoms. Notably, the favorable (i.e., negative) shifts in onset potentialfor the flow of dark current engendered by organic and inorganic surfacemodifiers are additive. Furthermore, they appear to be largely insensitiveto the identity of shuttle molecules. [ABSTRACT FROM AUTHOR]

A major loss mechanism in dye-sensitized solar cells (DSCs) is recombination at the TiO2/ electrolyte interface. Here we report a method to reduce greatly this loss mechanism. We deposit insulating and transparent silica (SiO2) onto the open areas of a nanoparticulate TiO2 surface while avoiding any deposition of Si02 over or under the organic dye molecules. The SiO2 coating covers the highly convoluted surface of the TiO2 conformally and with a uniform thickness throughout the thousands of layers of nanoparticles, DSCs incorporating these selective and self-aligned SiO2 layers achieved a 36% increase in relative efficiency versus control uncoated cells. [ABSTRACT FROM AUTHOR]