Search

Molybdenum disulfide (MoS2) is a popular lamellar material with desirable properties who's form, and function can vary widely, from particles to monolayer/μm thick films and applications in semiconductors to aerospace lubricants and many more. Physical vapor deposition (PVD) is commonly used to produce dense, conformal micron thick MoS2 coatings, but lacks the ability to coat more complex geometries due to line-of-sight constraints and typically exhibit amorphous or nanocrystalline microstructures. Atomic layer deposition (ALD) has also been employed to deposit monolayer to 10's of nanometers thick lamellar solids like MoS2 & WS2 in transistor, sensors or electrocatalyst applications but not commonly for applications as solid lubricants in aerospace like their PVD counterparts. While recent work has shown that ALD MoS2 can exhibit favorable microstructures for solid lubricant applications and allows for non-line of sight deposition on complex geometries, it has not been widely adopted due to high deposition temperatures (>500 °C) that can lead to softening of steel substrates. In this work, we show one of the first applications highlighting the use of ultra-thin (5–10 nm) low temperature (∼250 °C) MoS2 coatings as a promising solid lubricant for macroscale mechanical interfaces. Post-deposition chemical conversion of ALD MoOx to MoS2 by annealing in H2S at temperatures ranging from 200 to 550 °C resulted in highly-ordered basally-oriented surface microstructures. The results from this work suggest that converted-ALD MoS2 coatings can serve as viable solid lubricants for aerospace applications requiring low-temperature processing, including those with complex geometries.

As one of the highest mobility semiconductor materials, carbon nanotubes (CNTs) have been extensively studied for use in field effect transistors (FETs). To fabricate surround-gate FETs- which offer the best switching performance-deposition of conformal, weakly-interacting dielectric layers is necessary. This is challenging due to the chemically inert surface of CNTs and a lack of nucleation sites-especially for defect-free CNTs. As a result, a technique that enables integration of uniform high-k dielectrics, while preserving the CNT's exceptional properties is required. In this work, we show a method that enables conformal atomic layer deposition (ALD) of high-k dielectrics on defect-free CNTs. By depositing a thin Ti metal film, followed by oxidation to TiO2 under ambient conditions, a nucleation layer is formed for subsequent ALD deposition of Al2O3. The technique is easy to implement and is VLSI-compatible. We show that the ALD coatings are uniform, continuous and conformal, and Raman spectroscopy reveals that the technique does not induce defects in the CNT. The resulting bilayer TiO2/Al2O3 thin-film shows an improved dielectric constant of 21.7 and an equivalent oxide thickness of 2.7 nm. The electrical properties of back-gated and top-gated devices fabricated using this method are presented.

Molybdenum disulfide (MoS 2) is a popular lamellar material with desirable properties who's form, and function can vary widely, from particles to monolayer/μm thick films and applications in semiconductors to aerospace lubricants and many more. Physical vapor deposition (PVD) is commonly used to produce dense, conformal micron thick MoS 2 coatings, but lacks the ability to coat more complex geometries due to line-of-sight constraints and typically exhibit amorphous or nanocrystalline microstructures. Atomic layer deposition (ALD) has also been employed to deposit monolayer to 10's of nanometers thick lamellar solids like MoS 2 & WS 2 in transistor, sensors or electrocatalyst applications but not commonly for applications as solid lubricants in aerospace like their PVD counterparts. While recent work has shown that ALD MoS 2 can exhibit favorable microstructures for solid lubricant applications and allows for non-line of sight deposition on complex geometries, it has not been widely adopted due to high deposition temperatures (>500 °C) that can lead to softening of steel substrates. In this work, we show one of the first applications highlighting the use of ultra-thin (5–10 nm) low temperature (∼250 °C) MoS 2 coatings as a promising solid lubricant for macroscale mechanical interfaces. Post-deposition chemical conversion of ALD MoO x to MoS 2 by annealing in H 2 S at temperatures ranging from 200 to 550 °C resulted in highly-ordered basally-oriented surface microstructures. The results from this work suggest that converted-ALD MoS 2 coatings can serve as viable solid lubricants for aerospace applications requiring low-temperature processing, including those with complex geometries. • Low-temperature conversion results in basally-oriented MoS 2 coatings • 5–10 nm thick MoS 2 films achieve low wear rates <1 × 10−6 mm3/Nm. • Low initial friction (< 0.1) is achieved at conversion temperatures below 250 °C. • Sustained low friction (∼0.05) is achievable at temperatures as low as 200 °C. • Demonstrate suitability of converted MoS 2 coatings for macroscale applications [ABSTRACT FROM AUTHOR]