1. The structure and properties of (aluminum, oxygen) defect complexes in silicon.
- Author
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Shi, Tingting, Yin, Wan-Jian, Wu, Yelong, Al-Jassim, Mowafak, and Yan, Yanfa
- Subjects
ALUMINUM ,ATOMIC structure ,SILICON research ,ELECTRIC properties ,SEMICONDUCTOR wafers ,BAND gaps ,DIMERS - Abstract
The atomic structure and electronic properties of aluminum (Al)-related defect complexes in silicon (Si) are investigated using first-principles calculations. Individual substitutional Al (AlSi), interstitial Al (Ali) and their possible complex configurations with oxygen (O) atoms are studied. We find a unique stable complex configuration consisting of an Ali and an oxygen dimer, Ali-2Oi, which introduces deep levels in the band gap of Si. The formation energies of the Ali-2Oi complexes could be lower than that of individual Ali atoms under oxygen-rich conditions. The formation of Ali-2Oi complexes may explain the experimental observation that the coexistence of Al and O results in reduced carrier lifetime in Si wafers. [ABSTRACT FROM AUTHOR]
- Published
- 2013
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