1. Damage accumulation and annealing behavior in high fluence implanted MgZnO
- Author
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Azarov, A.Yu., Hallén, A., Svensson, B.G., Du, X.L., and Kuznetsov, A.Yu.
- Subjects
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ANNEALING of crystals , *ION implantation , *EPITAXY , *BACKSCATTERING , *SPECTROMETRY , *MOLECULAR beams , *ZINC oxide - Abstract
Abstract: Molecular beam epitaxy grown MgxZn1−xO (x ⩽0.3) layers were implanted at room temperature with 150keV 166Er+ ions in a fluence range of 5×1015–3×1016 cm−2. Evolution of ion-induced damage and structural changes were studied by a combination of Rutherford backscattering spectrometry, nuclear reaction analysis and time-of-flight elastic recoil detection analysis. Results show that damage production enhances in both Zn- and O-sublattices with increasing the Mg content in the MgZnO. However, MgZnO as well as pure ZnO exhibits a high degree of dynamic annealing and MgZnO can not be amorphized even at the highest ion fluence used. Annealing of heavily damaged ZnO leads to a strong surface erosion and thinning of the film. Increasing the Mg content suppresses the surface evaporation in high fluence implanted MgZnO but leads to a strong surface decomposition accompanied with a Mg-rich surface layer formation during post-implantation annealing. [Copyright &y& Elsevier]
- Published
- 2012
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