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Abstract: Rod–coil block copolymers are an increasingly important class of molecules for the self-assembly of functional polymer systems, many of which have rodlike chain conformations due to rigid secondary structures, extended π-conjugation, or aromatic groups along the polymer backbone. Examples of these polymers are helical proteins, polyisocyanates, main-chain semiconducting polymers, and aromatic polyesters, polyamides, or polyimines. Many hindered or liquid crystalline systems self-assembled from block copolymers, including dendronized polymers and mesogen-jacketed liquid crystalline polymers, also form rod–coil block copolymers. In these cases, steric crowding of the bulky or mesogenic side chains causes the polymer backbone to become quasi-linear. The incorporation of rigid rod polymers into the block copolymers results in extremely rich self-assembly behavior that differs markedly from that of traditional block copolymers due to the interplay between microphase separation of the rod and coil components and liquid crystalline alignment. The combination of these effects results in novel structures both in solution and melts. This review discusses in detail the self-assembly and thermodynamics of rod–coil diblock and triblock copolymers. After summarizing the applications of these materials, their aggregation and gelation in solution is discussed. Our knowledge of their bulk phase behavior is thoroughly reviewed both from the experimental and theoretical perspectives, and the self-assembly of these materials in thin film geometries that are critical to many applications in organic electronics and functional surface patterning is treated. Finally, the outlook for the future of these systems is summarized along with current knowledge gaps and exciting areas for the advancement of the field. [Copyright &y& Elsevier]

The article discusses the development in directing self-assembly of block copolymers. This study focused on the nanoscale features of block copolymers as means of turning a pattern media in microelectronic applications. Researches are under way for a new route to nanopatterning which is very significant in optical lithography. The semiconductor industry needs intrinsic technology to answer for the demands in high-density features for data storage and computing speed. New applications are tested for further developments.