1. Observation of non-radiative de-excitation processes in silicon nanocrystals
- Author
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B. Sherliker, Andrew P. Knights, J. N. Milgram, Russell M. Gwilliam, Jacek Wojcik, Peter Mascher, Matthew P. Halsall, and Iain F. Crowe
- Subjects
business.industry ,Chemistry ,Surfaces and Interfaces ,Radiation ,Condensed Matter Physics ,Molecular physics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Auger ,Ion implantation ,Optics ,Nanocrystal ,Materials Chemistry ,Radiative transfer ,Electrical and Electronic Engineering ,business ,Luminescence ,Intensity (heat transfer) ,Excitation - Abstract
We describe the impact of non-radiative de-excitation mechanisms on the optical emission from silicon nanocrystals formed in SiO 2 . Auger excitation via free carriers deliberately introduced through phosphorus ion implantation, shows a monotonic increase with increasing phosphorus concentration which can be modelled adequately using a simple statistical approach. We also report a reduction in nanocrystal luminescence intensity with increasing exposure to UV radiation and suggest this phenomenon results from the introduction of non-radiative defects in the Si/SiO 2 network. The effect of UV radiation varies significantly depending on the sample preparation.
- Published
- 2009
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