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Spatially patterned dielectric materials are ubiquitous in electronic, photonic, and optoelectronic devices. These patterns are typically made by subtractive or additive approaches utilizing vapor-phase reagents. On the other hand, recent advances in solution-phase synthesis of oxide nanomaterials have unlocked a materials library with greater compositional, microstructural, and interfacial tunability. However, methods to pattern and integrate these nanomaterials in real-world devices are less established. In this work, we directly optically pattern oxide nanoparticles (NPs) by mixing them with photosensitive diazo-2-naphthol-4-sulfonic acid and irradiating with widely available 405 nm light. We demonstrate the direct optical lithography of ZrO2, TiO2, HfO2, and ITO NPs and investigate the chemical and physical changes responsible for this photoinduced decrease in solubility. Micron-thick layers of amorphous ZrO2 NPs were patterned with micron resolution and shown to allow 2π phase control of visible light. We also show multilayer patterning and use it to fabricate features with different thicknesses and distinct structural colors. Upon annealing at 400 °C, the deposited ZrO2 structures have excellent optical transparency across a wide wavelength range (0.3-10 μm), a high refractive index (n = 1.84 at 633 nm), and are optically smooth. We then fabricate diffractive optical elements, such as binary phase diffraction gratings, that show efficient diffractive behavior and good thermal stability. Different oxide NPs can also be mixed prior to patterning, providing a high level of material tunability. This work demonstrates a general patterning approach that harnesses the processability and diversity of colloidal oxide nanomaterials for use in photonic applications.

The purposes are to analyze the mechanism of digitized landscape architecture design and stablize the garden landscape image display in constructing garden landscape digitization platform. According to previous research and mobile edge computing, a scheme of digitized landscape architecture design is proposed based on edge computing. This scheme uses discrete elevation calculation to preserve the landscape design image’s frame. It adopts the Roberts edge detection and Laplacian operator for high-level stable preservation of landscape images. Simultaneously, the displayed image is stablized using edge computing algorithms. Simulation experiments are performed to verify the effectiveness of the proposed scheme of digitized landscape architecture design based on mobile edge computing. Results demonstrate that the discrete elevation calculation algorithm can avoid low visual rendering in the 3D image generation process, optimize the seed point matching of edge correlation, and ensure image clarity and stability. The edge computing algorithm can fundamentally avoid the problem of image shaking. The impact of different algorithm models on the classification and accuracy of landscape images is analyzed through parameter optimization. Compared with some latest models, the proposed landscape design scheme based on edge computing has better accuracy. The average accuracy can reach more than 90%, and the Kappa coefficient remains at 86.93%. The designed garden landscape digitization platform can stably display 3D garden landscape images while avoiding the shaking of 3D images, which can provide a theoretical basis and practical value for designing and planning landscape architecture.

Precise patterning of quantum dot (QD) layers is an important prerequisite for fabricating QD light-emitting diode (QLED) displays and other optoelectronic devices. However, conventional patterning methods cannot simultaneously meet the stringent requirements of resolution, throughput, and uniformity of the pattern profile while maintaining a high photoluminescence quantum yield (PLQY) of the patterned QD layers. Here, a specially designed nanocrystal ink is introduced, "photopatternable emissive nanocrystals" (PENs), which satisfies these requirements. Photoacid generators in the PEN inks allow photoresist-free, high-resolution optical patterning of QDs through photochemical reactions and in situ ligand exchange in QD films. Various fluorescence and electroluminescence patterns with a feature size down to ≈1.5 µm are demonstrated using red, green, and blue PEN inks. The patterned QD films maintain ≈75% of original PLQY and the electroluminescence characteristics of the patterned QLEDs are comparable to thopse of non-patterned control devices. The patterning mechanism is elucidated by in-depth investigation of the photochemical transformations of the photoacid generators and changes in the optical properties of the QDs at each patterning step. This advanced patterning method provides a new way for additive manufacturing of integrated optoelectronic devices using colloidal QDs.