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Veeco MOCVD solutions are capable of supporting multiple substrates (GaAs, InP, sapphire, Si), and offer seamless transition to larger substrate sizes. For 6” GaAs red micro LED, Lumina® has demonstrated total population wavelength yield of >95% in 3 nm bin with defectivity 2um and 25% higher throughput than other platforms. For 6” sapphire miniLED, EPIK® has demonstrated within wafer wavelength 1sigma uniformity of 0.68nm (blue) / 1.24nm (green). For microLED on 200mm and 300mm silicon, Veeco has developed Propel® single wafer reactor for best in-class uniformity. Details of the technology and current data will be discussed.

We’ve developed a next-generation MOCVD platform for high-performance, commercial VCSEL production. The tool is capable of achieving total population uniformity >95% yield in +/- 3nm bin on 6” GaAs. In addition, the tool is capable to go >300 runs between maintenance while maintaining very fast growth rate up to 4.2micron / hr and low [C] impurity 2 micron size have been demonstrated. Correlation of epi and VCSEL device parameters such as threshold current density (Jth) and power conversion efficiency will be discussed.

As guest editors for the special section on the 2018 International Conference on Compound Semiconductor Manufacturing Technology (CS-MANTECH), we are pleased to present IEEE Transactions on Semiconductor Manufacturing readers with a selection of papers based on work presented at the 2018 edition of the conference. The CS-MANTECH conference is a valuable technical forum for presenting advancements in compound semiconductor devices, with particular emphasis on the associated manufacturing technologies. Devices based on compound semiconductors have long been used in RF, microwave, and millimeter-wave systems for their high performance, and compound-semiconductors are increasingly finding their way into power systems (through advancements in SiC and GaN device technology). Compound semiconductors are also critical for optoelectronic applications such as detectors, LEDs, and lasers as well. Recently, trends towards tighter integration with silicon-based technologies to provide enhanced system-level performance and functionality have been accelerating.

As guest editors for the special section on the 2017 International Conference on Compound Semiconductor Manufacturing Technology (CS-MANTECH), we are pleased to present IEEE Transactions on Semiconductor Manufacturing readers with a selection of papers based on work presented at this year’s conference. The CS-MANTECH conference provides a technical forum for presenting advances in compound semiconductor devices and associated manufacturing technologies. The high performance of devices based on compound semiconductors has long made them the material of choice in RF, microwave, and millimeter-wave systems. While advances continue to be made in these traditional applications, compound semiconductors are increasingly finding their way into power systems via SiC and GaN device technologies, and are also increasingly integrated with silicon-based technologies to provide enhanced system-level performance and functionality. In addition, narrow-gap III-Vs are being explored as alternative-channel materials for aggressively-scaled logic.

An enhancement of radiative recombination in GaInN/GaN heterostructures is being pursued by a reduction of defects associated with threading dislocations and a structural control of piezoelectric polarization in the active light-emitting regions. First, in conventional heteroepitaxy on sapphire substrate along the polar c-axis of GaN, green and deep green emitting light-emitting diode (LED) wafers are being developed. By means of photoluminescence at variable low temperature and excitation density, internal quantum efficiencies of 0.18 for LEDs emitting at 530 nm and 0.08 for those emitting at 555 nm are determined. Those values hold for the high current density of 50 A/cm 2 of high-power LED lamps. In bare epi dies, we obtain efficacies of 16 lm/W. At 780 A/cm 2 we obtain 22 lm when measured through the substrate only. The 555 nm LED epi material under pulsed photoexcitation shows stimulated emission up to a wavelength of 485 nm. This strong blue shift of the emission wavelength can be avoided in homoepitaxial multiple quantum well (MQW) and LED structures grown along the non-polar a- and m-axes of low-dislocation-density bulk GaN. Here, wavelength-stable emission is obtained at 500 and 488 nm, respectively, independent on excitation power density opening perspectives for visible laser diodes.

We demonstrate homoepitaxial growth of GaInN/GaN-based green (500–560 nm) light emitting diodes (LEDs) on a-plane and m-plane quasi-bulk GaN prepared by hydride vapor phase epitaxy (HVPE). We find that in order to achieve an emission peak wavelength beyond 500 nm, a minimum InN-fraction of ∼14% is needed for both, a- and m-plane quantum wells (QWs), while ∼8% are enough for c-plane-oriented QWs. Besides increasing the InN-fraction in these non-polar QWs, widening the QW also proves to effectively shift the emission to longer wavelengths without loosing efficiency with the benefit of maintaining a low InN-fraction.

GaInN/GaN multiple quantum well light-emitting diode structures in polar c -axis and non-polar m -axis growth have been compared in terms of luminescence properties. Grown under identical conditions, under low excitation density the c -axis structure has a luminescence maximum at 558 nm while the m -axis structure shows a maximum at 488 nm and shows superluminescence at 485 nm under high photoexcitation density. Under the same conditions, on increasing the excitation power, the peak intensity increases 40 fold in the m -axis structure without any variation of the emission wavelength. In similar but separately grown c -axis structures without a p-side, luminescence shifts from 555 nm at low excitation density to superluminescence at 485 nm under high excitation. The coincidence, of the superluminescence wavelength in the polar structure with the stable peak wavelength in the non-polar one, suggests that the wavelength shift in the polar structure is due to its piezoelectric polarization. The absence of such effects in the m -axis-grown structure therefore suggests a stronger dipole matrix element, potentially enabling higher quantum efficiencies and suitability for high efficiency light-emitting diode and laser diode designs in the green spectral region.

Thick c- plane (0 0 0 1)-oriented native GaN boules that have been produced by hydride vapor phase epitaxy and non-polar native m- plane (1 1 0 0) and a- plane (1 1 2 0) GaN substrates have been sliced from these crystals using a multiwire saw. An optimized polishing procedure was used to achieve a smooth epi-ready surface morphology on the finished substrates, with an RMS roughness of 0.43 nm. The non-polar substrates had two types of structural characteristics in appearance : one group was uniform, transparent and nearly colorless; while the second group had regions of varying coloration resulting from transecting V -shape pitting defects in the bulk GaN crystal. These regions had different cathodoluminescence properties but similar dislocation densities of 6 cm −2 . The native non-polar GaN substrates had orders of magnitude lower defect densities, including stacking faults, in comparison to heteroepitaxially grown quasi-substrates in non-polar direction on foreign substrates and subsequently delaminated. The structural characteristics demonstrated the current state-of-the-art in non-polar GaN substrate quality and additionally point at remaining improvement opportunities in substrate size and uniformity.

Large gallium nitride (GaN) crystals were grown using a hydride vapor phase epitaxy (HVPE) technique and were processed into substrates for device applications. Polishing procedures were developed for GaN substrates to produce surfaces prepared for epitaxial growth. Surface preparation of (0001) and (0001) substrates was examined, along with preparation of (1 120) and (1100) non-polar surfaces. For all surfaces, chemical mechanical polishing (CMP) resulted in an average root mean square (RMS) surface roughness on a 5 μm x 5 μm scanning probe microscope (SPM) image of

We report on the structural and electrical properties of AlGaN/GaN heterostructures grown by molecular beam epitaxy on low-dislocation-density, free standing GaN substrates grown by hydride vapor phase epitaxy. Structural characterization by atomic force microscopy, transmission electron microscopy, and X-ray diffractometry reveal a smooth surface morphology, coherent interfaces, an absence of dislocations generated in the epitaxial layers, and narrow X-ray peaks. Hall measurements indicate room temperature electron mobilities of 1750 cm 2 /V s at sheet densities of 1.1×10 13 cm −2 . High electron mobility transistors exhibit excellent electrical characteristics, including output power densities of 4.8 W/mm at 10 GHz, off-state breakdown voltages of up to 200 V, and extrinsic cut-off frequencies of 36 GHz on devices with 0.45-μm gate lengths.

We investigate the role of substrate temperature and gallium flux on the DC and microwave properties of AlGaN/GaN high electron mobility transistors grown by molecular-beam epitaxy on free standing, hydride vapor phase epitaxy grown GaN substrates. The free-standing substrates have threading dislocation densities below 10 7 cm −2 . We find that AlGaN/GaN heterostructures with excellent properties may be grown within a wide range of substrate temperatures and fluxes. Electron Hall mobilities above 1700 cm 2 /V s and sheet resistances below 370 Ω/□ are typical. We are able to obtain high saturated drain currents with low gate leakage. Off-state breakdown voltages as high as 200 V with low drain and gate leakage currents have been measured. Further, we have measured microwave output power densities above 5 W/mm at 4 GHz with a power-added efficiency of 46% and an associated gain of 13.4 dB. We attribute improved electrical properties in these devices to the reduced threading dislocation density compared to those grown on non-native substrates.

We demonstrate homoepitaxial growth of GaInN/GaN-based light emitting diodes (LED) on quasi-bulk GaN with an atomically flat polished surface. The threading dislocation densities of the epitaxial layers were 2-5 x 10 8 cm -2 which was one order of magnitude less than those grown on c-plane sapphire substrate. The growth defects introduced during the epitaxial process were also one order of magnitude smaller than those grown on the sapphire substrate. The crystalline quality and the optical properties of the epitaxial layer and device performance were much improved. The optical output power of the light emitting diode increased by more than one order of magnitude compared to those on sapphire substrate.

The performance of high power transistor devices is intimately connected to the substrate thermal conductivity. In this study, the relationship between thermal conductivity and dislocation density is examined using the 3 omega technique and free standing HVPE GaN substrates. Dislocation density is measured using imaging cathodoluminescence. In a low dislocation density regime below 105 cm−2, the thermal conductivity appears to plateau out near 230 W/K m and can be altered by the presence of isotopic defects and point defects. For high dislocation densities the thermal conductivity is severely degraded due to phonon scattering from dislocations. These results are applied to the design of homoepitaxially and heteroepitaxially grown HEMT devices and the efficiency of heat extraction and the influence of lateral heat spreading on device performance are compared.

We report the development of non-polar light emitting diodes (LEDs) covering the emission spectra from 480 to 520 nm (dominant wavelength), i.e. from cyan to the green region. The devices are obtained via GaInN-based homoepitaxy on non-polar m -plane GaN bulk substrate. Owing to the absence of piezoelectric polarization, these LEDs exhibit stable emission color with a wavelength shift less than 3 nm when the drive current density is changed from 0.1–30 A/cm2. However, we observe a decreasing electroluminescence efficiency as the emission wavelengths increases from cyan to green. We tentatively attribute this to a higher density of defects in the longer wavelength structures. (© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

AlxGa1-xN (x=0.05) ultraviolet (UV) avalanche photodiodes grown on a GaN substrate are reported. The epitaxial structure was grown by metal-organic chemical vapor deposition on a free-standing bulk GaN substrate having low dislocation density. The growth conditions for AlxGa1-xN epitaxial layers on GaN substrates were optimized to achieve improved crystalline and structural quality. With UV illumination at lambda~250 nm, devices with mesa diameters of ~30 mum achieve stable maximum optical gains of ~50 at a reverse bias voltage of ~87 V.

A comprehensive overview is provided for the current state of production-scale molecular beam epitaxy (MBE) system hardware and applications as well as future directions in production-scale MBE. An introduction is provided, discussing the applications and markets for which devices are mass produced by MBE. This is compared and contrasted alongside other competing manufacturing techniques such as metalorganic chemical vapor deposition (MOCVD). The current state of production MBE hardware is also presented, with a thorough review of all critical system subassemblies and components. The design needs of the production-scale hardware are contrasted with the needs of smaller, research and development (R&D)-scale MBE systems. A number of the hardware and process challenges in scaling from typical R&D-scale MBE systems to production-scale systems are discussed along with the common techniques for mitigating these issues. Finally, a discussion of the future trends and opportunities in the production MBE is presented. We provide an overview, covering a wide range of material and device applications that are currently areas of active R&D that have the potential to evolve to large-volume production in the future. The potential and challenges of many of these new devices and applications are discussed along with due consideration to the viability of alternative techniques such as MOCVD.

Received 2 September 2009; revised manuscript received 29 January 2010; published 22 March 2010 The creation of symmetrical pairs of inclined dislocations was observed in the GaInN/GaN quantum wells QWs of c-axis grown green light-emitting diodes LEDs on low-defect density bulk GaN substrate, but not in green LEDs on sapphire substrate with high threading dislocation TD density. Pairs of dislocations start within 20 nm of the same QW and incline 18° – 23° toward two opposite 11 ¯ 00 directions or in a 120° pattern. We propose that in the absence of TDs, partial strain relaxation of the QWs drives the defect formation by removal of lattice points between the two dislocation cores. In spite of those inclined dislocation pairs, the light output power of such green LEDs on GaN is about 25% higher than in LEDs of similar wavelength on sapphire.

Despite the rapid commercialization of III-nitride semiconductor devices for applications in visible and ultraviolet optoelectronics and in high-power and high-frequency electronics, their full potential is limited by two primary obstacles: i) a high defect density and biaxial strain due to the heteroepitaxial growth on foreign substrates, which result in lower performance and shortened device lifetime, and ii) a strong built-in electric field due to spontaneous and piezoelectric polarization in the wurtzite structures along the well-established [0001] growth direction for nitrides. Recent advances in the research, development, and commercial production of native GaN substrates with low defect density and high structural and optical quality have opened opportunities to overcome both of these obstacles and have led to significant progress in the development of several opto-electronic and high-power devices. In this paper, the recent achievements in bulk GaN growth development using different approaches are reviewed; comparison of the bulk materials grown in different directions is made; and the current achievements in device performance utilizing native GaN substrate material are summarized. ©2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. Tanya Paskova, Drew A. Hanser and Keith R. Evans, GaN Substrates for III-Nitride Devices, 2010, Proceedings of the IEEE, (98), 7, 1324-1338.http://dx.doi.org/10.1109/JPROC.2009.2030699

Wide-bandgap III-nitride-based avalanche photodiodes (APDs) are important for photodetectors operating in UV spectral region. For the growth of GaN-based heteroepitaxial layers on lattice-mismatched substrates such as sapphire and SiC, a high density of defects is introduced, thereby causing device failure by premature microplasma breakdown before the electric field reaches the level of the bulk avalanche breakdown field, which has hampered the development of III-nitride based APDs. In this study, we investigate the growth and characterization of GaN and AlGaN-based APDs on free-standing bulk GaN substrates. Epitaxial layers of GaN and AlxGa1−xN p-i-n ultraviolet avalanche photodiodes were grown by metalorganic chemical vapor deposition (MOCVD). Improved crystalline and structural quality of epitaxial layers was achieved by employing optimum growth parameters on low-dislocation-density bulk substrates in order to minimize the defect density in epitaxially grown materials. GaN and AlGaN APDs were fabricated into 30μm- and 50μm-diameter circular mesas and the electrical and optoelectronic characteristics were measured. APD epitaxial structure and device design, material growth optimization, material characterizations, device fabrication, and device performance characteristics are reported.

High quality, single crystal GaN substrates have been demonstrated using a boule growth process. Here we report on the crystalline boules that were formed during the growth process and their material characterization. Using hydride vapor phase epitaxy process, GaN crystals were grown at growth rates greater than 200 μm/hr. Boules greater than 3 mm thick were grown and processed into free-standing substrates. Rocking curve measurements using high-resolution X-ray diffraction were performed on the substrates with FWHM values of 92 and 146 arcsec for the (002) and (102) reflections, respectively. Atomic force microscope images, etch pit studies, and transmission electron micrographs of the GaN material show high quality material quality with a dislocation density in the range of 5×106 to 1×107 cm-2.

Linearly polarized light emission is analyzed in nonpolar light-emitting diodes (LEDs) covering the blue to green spectral range. In photoluminescence, m-plane GaInN/GaN structures reach a polarization ratio from 0.70 at 460 nm to 0.89 at 515 nm peak wavelength. For a-plane structures, the polarization ratio is 0.53 at 400 nm and 0.60 at 480–510 nm. In electroluminescence the polarization ratio is 0.77 at 505 nm in 350×350 µm2m-plane devices at 20 mA. Such a device should allow 44% power saving compared with nonpolarized c-plane LEDs combined with a polarizing filter, as commonly used in LED-backlit liquid crystal displays.

We report the development of 480 nm cyan and 520 nm green light emitting diodes (LEDs) with a highly stable emission wavelength. The shift is less than 3 nm when the drive current density is changed from 0.1 to 38 A/cm2. LEDs have been obtained in GaInN-based homoepitaxy on nonpolar m-plane GaN bulk substrates. For increasing emission wavelength we find a large number of additional dislocations generated within the quantum wells (2×108 to ∼1010 cm2) and a decrease in the electroluminescence efficiency. This suggests that the strain induced generation of defects plays a significant role in the performance limitations.

We report the development of 520–540nm green light emitting diodes (LEDs) grown along the nonpolar a axis of GaN. GaInN∕GaN-based quantum well structures were grown in homoepitaxy on both, a-plane bulk GaN and a-plane GaN on r-plane sapphire. LEDs on GaN show higher, virtually dislocation-free crystalline quality and three times higher light output power when compared to those on r-plane sapphire. Both structures show a much smaller wavelength blue shift for increasing current density (

The authors have studied the effects of Fe doping at the interface between GaN epitaxial layers for heterostructure field-effect transistors grown by metal-organic chemical vapor deposition and the corresponding impact on the device characteristics. The epitaxial structures were grown with different Fe-doped GaN layers at the layer-template interface. Analysis of the measured electron and interface charge distributions in the heterostructures demonstrated the important role of Fe doping at the regrowth interface. No charge at the regrowth interface was observed in transistor structures with a thick Fe-doped layer. Characterization of the electrical properties of the transistor structures revealed the presence of high sheet carrier concentrations and improved mobilities with increasing thickness of the Fe-doped GaN layer at the regrowth interface.

We report the performance of GaN p-i-n ultraviolet avalanche photodiodes grown on bulk GaN substrates by metal-organic chemical vapor deposition. The low dislocation density in the devices enables low reverse-bias dark currents prior to avalanche breakdown for ∼30μm diameter mesa photodetectors. The photoresponse is relatively independent of the bias voltage prior to the onset of avalanche gain which occurs at an electric field of ∼2.8MV∕cm. The magnitude of the reverse-bias breakdown voltage shows a positive temperature coefficient of ∼0.05V∕K, confirming that the avalanche breakdown mechanism dominates. With ultraviolet illumination at λ∼360nm, devices with mesa diameters of ∼50μm achieve stable maximum optical gains greater than 1000. To the best of our knowledge, this is the highest optical gain achieved for GaN-based avalanche photodiodes and the largest area III-N avalance photodetectors yet reported.

In this study, we characterized the structural defects in blue and green GaInN/GaN LEDs grown on c-plane bulk GaN and sapphire substrates. Low density large V-defects with diameters around 600 nm were found in the blue LEDs on bulk GaN. They were initiated by edge-type threading dislocations (TDs) around the homoepitaxial growth interface. On the other hand, a high density 7×109 cm−2 of smaller V-defects with sidewalls on {1101} facets was observed in the active region of green LEDs on sapphire. Their diameter ranges from 150 to 200 nm. Misfit dislocations (MDs) generated in the quantum wells are found to initiate these V-defects. With optimizing the epitaxial growth conditions, the generation of MDs and their smaller V-defects was largely suppressed. As a result, the light output power improved by one order of magnitude. For green LEDs on bulk GaN, another unique type of defect was found in the active region: an inclined dislocation pair (IDP). In it a pair of dislocations propagate at a tilt angle of 18 to 23° from the [0001] growth direction towards 100>. This defect seems to be a path of strain relief in the high indium composition quantum wells.