1. Large area VHF plasma production by a balanced power feeding method
- Author
-
Y. Takeuchi, T. Shioya, Yasuhiro Yamauchi, Hiromu Takatsuka, Yoshinobu Kawai, Hiroshi Muta, and Tatsuyuki Nishimiya
- Subjects
Electron density ,Chemistry ,business.industry ,technology, industry, and agriculture ,Metals and Alloys ,Analytical chemistry ,Surfaces and Interfaces ,Plasma ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,Power (physics) ,symbols.namesake ,law ,Solar cell ,Materials Chemistry ,symbols ,Optoelectronics ,Langmuir probe ,Electron temperature ,Plasma diagnostics ,Thin film ,business - Abstract
We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate of microcrystalline silicon films.
- Published
- 2008
- Full Text
- View/download PDF