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Temperature-dependent cathodoluminescence spectra were measured for rock salt-structured MgxZn1−xO films with x = 0.95–0.61. The Mg0.95Zn0.05O film exhibited the shortest deep UV peak wavelength of 199 nm (6.24 eV) at 6 K. Relatively high equivalent internal quantum efficiencies of 0.9%–11% were obtained. The Tauc plots, which were obtained from temperature-dependent optical transmittance measurements, exhibited large Stokes-like shifts of 0.7–0.9 eV at 6–300 K. Time-resolved photoluminescence (PL) signals at 7 K exhibited fast and slow decay components. The fast decay component had PL lifetimes of 2.59–3.08 ns, and the slow decay component far exceeded the measurement time range of 12.5 ns. The fast decay constant reflected the transfer lifetime of the photoexcited carriers to certain trapping centers. These centers were tentatively ascribed to Zn-related isoelectronic trapped-hole centers and may be a cause of the large Stokes-like shifts. The signals at 300 K exhibited very short PL lifetimes of 120–180 ps. The PL lifetimes were mainly attributed to the nonradiative recombination lifetime. Simultaneous decreases in the Zn-related isoelectronic trapped-hole centers and the nonradiative recombination centers were found to be necessary to improve the DUV emission properties of RS-MgxZn1−xO films. [ABSTRACT FROM AUTHOR]

Ga-rich zones created along macrosteps in n-AlGaN plausibly function as electron pathways of AlGaN-based deep-ultraviolet (DUV) LEDs fabricated on AlN templates using 1.0°-miscut c(0001) sapphire substrates toward the m[1-100] axis. This work was performed to clarify AlN mole fractions (xAl) of Ga-rich zones. xAl ≃ (7/12, 6/12, and 5/12) was observed in Ga-rich zones in AlαGa1−αN (α ≃ 0.63, 0.55, and 0.43, respectively) by the method proposed in our previous article in which we showed that Ga-rich zones of Al8/12Ga4/12N were created in Al0.7Ga0.3N. xAl in the Ga-rich zones obtained from an energy-dispersive x-ray signal by scanning transmission electron microscopy calibrated by Rutherford backscattering well agreed with xAl obtained by cross-sectional cathodoluminescence (CL) spectroscopy using scanning electron microscopy. A weak CL shoulder peak corresponding to Al4/12Ga8/12N was also observed for Al0.43Ga0.57N. In addition, xAl ≃ n/12 (n = 6–9) in Al-rich zones appeared in the rest of the Ga-rich zones. Furthermore, nanobeam electron diffraction patterns of the Ga-rich zones indicated a high possibility of a regular configuration of Ga and Al atoms on the c(0001) plane in our samples. Consequently, xAl values in nonflat AlGaN layers with macrosteps were often determined to be near n/12 (n: integer). Thus, Ga-rich zones (xAl = n/12: n = 4–8) formed in our nonflat AlGaN layers, which originated from the macrosteps along [11–20] edgelines normal to the m[1–100] axis, are suggested to be metastable. The creation of discrete xAl in Ga-rich zones should contribute to the stable production of DUV-LEDs using high-miscut sapphire substrates. [ABSTRACT FROM AUTHOR]

AlGaN-based deep-ultraviolet light-emitting diodes (LEDs) incorporating uneven multiple quantum wells (MQWs) with inclined and terrace zones, which were fabricated on an AlN template with dense macrosteps, have exhibited a high internal quantum efficiency (IQE). To investigate the microscopic structure of uneven MQWs, cathodoluminescence (CL) mapping characterization was carried out, and the maps of the CL intensity at 300 K relative to that at 38 K were obtained for uneven MQWs that targeted 265 and 285 nm LEDs. At an electron beam current of less than 1.0 nA, the signals from inclined and terrace zones of the uneven MQWs were confirmed to satisfy the nonsaturated excitation condition at 300 K. Nonradiative recombination (NR) was insufficiently frozen even at 38 K, specifically on the terraces in the 265 nm MQW, suggesting high concentrations of NR centers due to point defects (PDs). In contrast, NR in the 285 nm MQW at 38 K was closer to freeze-out. The concentration of PDs in the 285 nm MQW was likely to be lower than that in the 265 nm MQW. Finally, the ratios of the CL intensity at 300 K to those at 38 K were mapped, demonstrating an approach to creating an approximate map of IQE. The values in the CL intensity ratio maps are discussed by considering the analytical error factors. The results support the model of localized current injection through Ga-rich stripe zones in the n-AlGaN cladding layer. [ABSTRACT FROM AUTHOR]

Herein, the annealing behaviors of defects in ion‐implanted GaN are studied by positron annihilation, cathodoluminescence, scanning transmission electron microscopy, and atom probe tomography. Si or Mg ions are implanted into GaN to obtain 300 nm deep box profiles of the impurities. The samples are annealed up to 1480 °C under a N2 pressure of 1 GPa. For as‐implanted GaN, the major defect species is identified as Ga‐vacancy‐type defects. After annealing above 1000 °C, vacancy clusters are introduced, and they remain even after 1480 °C annealing. For Mg‐implanted GaN with the Mg concentration ([Mg]) ≤ 1018 cm−3, no large change in the depth distribution of Mg is observed before and after annealing at 1400 °C. For the sample with [Mg] = 1019 cm−3, however, Mg diffuses into the bulk, which is attributed to the over‐doping of Mg and their vacancy‐assisted diffusion. The Mg diffusion is suppressed, and the donor–acceptor pair emission is enhanced by sequential N‐implantation, which is attributed to the reaction between Mg and vacancies under a N‐rich condition. For the samples annealed at 1480 °C, an accumulation of Mg around dislocation loops and Mg clustering are enhanced by the N‐implantation [ABSTRACT FROM AUTHOR]

Energy-dispersive X-ray signals calibrated by Rutherford backscattering indicated the generation of Al13/24Ga11/24N in Ga-rich stripes in a nonflat Al0.58Ga0.42N layer. Also, the CL peak wavelengths of ∼259 and 272 nm also showed the generation of Al15/24Ga9/24N and Al13/24Ga11/24N in Al-rich zones and Ga-rich stripes, respectively. The wavelength of a strong CL peak at ∼246 nm, which was observed from the Al0.7Ga0.3N layer in our previous study, is also considered to correspond to the near-band-emission wavelengths of Al17/24Ga7/24N. In particular, the stronger reproducibility of metastable Al15/24Ga9/24N generation was confirmed, in agreement with the computed predictions by other research groups. [ABSTRACT FROM AUTHOR]

This letter presents a study on the nucleation and microstructural evolution of m-plane GaN epilayers on m-plane SiC substrates using high-temperature AlN buffer layers. Controlled growth interruptions were carried out to render snapshots of heteroepitaxial dynamics. It was discovered that island coalescence results in an inhomogeneous mosaic tilt along the c-axis. Mesoscopic study of nucleation evolution helps elucidate the origin of commonly observed surface undulation and striation, which is attributed to concave growth due to the coalescence of trapezoidal islands upon contact. A model correlating microstructural defects with optical properties is proposed to explain the observed pattern in spatially resolved cathodoluminescence mapping. [ABSTRACT FROM AUTHOR]

Immiscible semiconductors are of premier importance since the source of lighting has been replaced by white light-emitting-diodes (LEDs) composed of thermodynamically immiscible InxGa1−xN blue LEDs and yellow phosphors. For realizing versatile deep-ultraviolet to near-infrared light-emitters, Al1−xInxN alloys are one of the desirable candidates. Here we exemplify the appearance and self-formation sequence of compositional superlattices in compressively strained m-plane Al1−xInxN films. On each terrace of atomically-flat m-plane GaN, In- and Al-species diffuse toward a monolayer (ML) step edge, and the first and second uppermost < 1 - 1 - 20 > cation-rows are preferentially occupied by Al and In atoms, respectively, because the configuration of one In-N and two Al-N bonds is more stable than that of one Al-N and two In-N bonds. Subsequent coverage by next < 1 - 1 - 20 > Al-row buries the < 1 - 1 - 20 > In-row, producing nearly Al0.5In0.5N cation-stripe ordering along [0001]-axis on GaN. At the second Al0.72In0.28N layer, this ordinality suddenly lessens but In-rich and In-poor < 1 - 1 - 20 >-rows are alternately formed, which grow into respective {0001}-planes. Simultaneously, approximately 5-nm-period Al0.70In0.30N/Al0.74In0.26N ordering is formed to mitigate the lattice mismatch along [0001], which grow into approximately 5-nm-period Al0.70In0.30N/Al0.74In0.26N { 10 1 - 2 } superlattices as step-flow growth progresses. Spatially resolved cathodoluminescence spectra identify the emissions from particular structures. [ABSTRACT FROM AUTHOR]

Abstract: Single crystals of iron(II) pyroborate, Fe2B2O5, were prepared at 1000–1050°C under an argon atmosphere. The crystals were transparent, yellowish in color and needle-like or columnar. The crystal structure of Fe2B2O5 was analyzed by single-crystal X-ray diffraction. Refined triclinic unit cell parameters were a=3.2388(2), b=6.1684(5), c=9.3866(8)Å, α=104.613(3)°, β=90.799(2)° and γ=91.731(2)°. The final reliability factors of refinement were R1=0.020 and wR2=0.059 [I > 2σ(I)]. Transmittance over 50% in the visible light region from 500 to 750nm was observed for a single crystal of Fe2B2O5 with a thickness of about 0.3mm. The light absorption edge estimated from a diffuse reflectance spectrum was at around 350nm (3.6eV). Magnetic susceptibility was measured for single crystals at 4–300K. Fe2B2O5 showed antiferromagnetic behavior below the Néel temperature, T N≈70K, and the Weiss temperature was T W=36K. The effective magnetic moment of Fe was 5.3μ B. [Copyright &y& Elsevier]