1. Controlled Synthesis of Surface-Clean Monolayer Graphene
- Author
-
Meng Ke Zhao, Xue Shen Wang, Qing Zhong, Jin Jin Li, and Yuan Zhong
- Subjects
Materials science ,Graphene ,Annealing (metallurgy) ,Mechanical Engineering ,Nanotechnology ,Chemical vapor deposition ,Photoresist ,Monolayer graphene ,law.invention ,symbols.namesake ,chemistry.chemical_compound ,chemistry ,Chemical engineering ,Mechanics of Materials ,law ,symbols ,General Materials Science ,Methyl methacrylate ,Raman spectroscopy ,Cvd graphene - Abstract
Controlled synthesis surface-clean monolayer graphene was achieved. Monolayer Graphene was achieved by mechanical exfoliation (ME) and chemical vapor deposition (CVD),and then transferred to SiO2 (300nm)/Si substrates. There were tape residues left on the surface of the ME graphene, and poly (methyl methacrylate) (PMMA)/photoresist residues left on the surface of the CVD graphene after the transferring and lithography process. Annealing method was used to clean all these kinds of residues. Annealing processes were performed at different temperatures in both vacuum and N2/H2. It is conclude that N2/H2 is crucial for the removing of residues, and 400°C is favorable for removing the residues. Atomic force microscope (AFM) images and Raman spectra were taken to confirm the effect of the annealing.
- Published
- 2013