1. Dramatic Reduction of Contact Resistance via Ultrathin LiF in Two-Dimensional MoS2 Field Effect Transistors
- Author
-
Hyunmin Cho, Seongil Im, Heesun Bae, Yangjin Lee, Donghee Kang, Yeonjin Yi, Yongjae Cho, Sungjae Hong, Jihoon Park, and Kwanpyo Kim
- Subjects
Materials science ,business.industry ,Mechanical Engineering ,Contact resistance ,Transistor ,Lithium fluoride ,Bioengineering ,02 engineering and technology ,General Chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,law.invention ,chemistry.chemical_compound ,Semiconductor ,chemistry ,law ,Optoelectronics ,General Materials Science ,Field-effect transistor ,Electronics ,0210 nano-technology ,business ,Nanoscopic scale ,Molybdenum disulfide - Abstract
Molybdenum disulfide (MoS2) has been regarded as one of the most important n-type two-dimensional (2D) transition metal dichalcogenide semiconductors for nanoscale electron devices. Relatively high contact resistance (RC) remains as an issue in the 2D-devices yet to be resolved. Reliable technique is very compelling to practically produce low RC values in device electronics, although scientific approaches have been made to obtain a record-low RC. To resolve this practical issue, we here use thermal-evaporated ultrathin LiF between channel and source/drain metal to fabricate 2D-like MoS2 field effect transistors (FETs) with minimum RC. Under 4-bar FET method, RC less than ∼600 Ω·μm is achieved from the LiF/Au contact MoS2 FET. Our normal 2-bar FET with LiF thus shows the same mobility as that of 4-bar FET that should have no RC in principle. On the basis of these results, ultrathin LiF is also applied for transparent conducting oxide contact, successfully enabling transparent MoS2 FETs.
- Published
- 2021