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Thin film imaging offers the possibility of extending 248 nm lithography to sub 150 nm resolution. We have been working on a 248 nm bilayer imaging scheme which utilizes a thin Si-containing resist on top of a thick, planarizing underlayer. The image is developed in the top layer and transferred to the underlayer via O2-based plasma etching. This article focuses on three aspects of the critical transfer etch process: etch resistance of the imaging resist, profile control and resist roughening. The imaging resist thickness loss is very fast during the first few seconds of the etch after which the rate diminishes. The relative importance of three phenomena that can explain this nonlinear behavior: oxidation of silicon, deprotection of resist moieties, and plasma etching of resist, are discussed. Fourier transform infrared studies on imaging resist films indicate minimal deprotection-related film thickness losses. X-ray photoelectron spectroscopy analyses of etched films indicate that the extent of surface oxidation increases initially and then becomes constant. Thus, the etching of this category of resists can be described as a combination of the oxidation of the silicon species and sputtering of the oxide-like layer formed. Post-transfer etch profiles using an O2 plasma are shown, and methods to reduce imaging resist faceting and thickness loss either by modifying the imaging layer silicon content or by using passivating plasma chemistries are discussed. The effect of different etching chemistries and processing conditions on imaging layer roughening and striation formation on underlayer sidewalls are explained with the aid of scanning electron microscopy micrographs and atomic force microscopy images of etched feature sidewalls. It is shown that the SO2–O2 etch significantly reduces the sidewall roughness from the postlithograpy values. The ∼3.5 nm rms sidewall roughness observed postetch is comparable to postdeveloped roughness values measured for mature single layer resists. The printing of 125 nm line/space patterns and 150 nm trench features with 10:1 aspect ratios in the underlayer is also demonstrated.

Unitary impulse activity from tension receptors in the abomasal antrum in sheep anaesthetized with chloralose was studied with concurrent measurements of isometric tension in the antral wall, intraluminal pressures and electromyography (EMG). Rhythmical background activity had a close correlation with intraluminal pressure changes and usually a close correlation with local increases in EMG activity and isometric tension. Impulse frequencies increased, but were not sustained, following changes from isotonic to isometric conditions. Tension receptors were excited by transmural compression, by antral distension and by local intra-arterial injections of acetylcholine (2.5-25 micrograms), pentagastrin (10-20 micrograms), 5-hydroxytryptamine (1-20 micrograms), adrenaline (10 micrograms) cholecystokinin-8 (1-5 micrograms) or bradykinin (0.5-20 micrograms), and by systemic injections of bethanecol (5-1000 micrograms). Local intra-arterial perfusions of atropine (50 micrograms) and hexamethonium (100 micrograms) did not abolish spontaneous antral movements or affect the enhanced impulse activity evoked by acetylcholine or 5-hydroxytryptamine. Most antral tension receptors were excited by increases in antral tension or passive distension; they therefore functioned 'in series' with the muscularis externa. The discharges of three tension receptors were 'off-loaded' early during the contraction evoked by local injections of pentagastrin (10-20 micrograms).

The principal phenolic constituents were isolated from the exudate of the glandular trichomes of TURRICULA PARRYI, a California shrub that causes severe contact dermatitis. The phenolic constituents consist of a complex mixture of methoxylated flavones and derivatives of both farnesylhydroquinone and 3-farnesyl- P-hydroxybenzoic acid in which the C-7 methyl of farnesyl is replaced by hydroxymethyl, formyl and carboxyl groups. Elicitors of allergic contact dermatitis were identified with guinea pigs sensitized to the crude exudate. The principal agents of dermatitis were the farnesyihydroquinone derivatives 3 and 6.

When solutions of zinc sulphate are administered to sheep by drenching gun (100 and 50 mg Zn/kg/day) the toxicity of zinc is markedly enhanced. Using a drenching gun method, severe lesions of the abomasum are encountered, serum and organ zinc levels are increased, pancreatic damage is severe, and even death may occur using doses which are apparently non-toxic when delivered by intraruminal intubation. It is suggested that the stimulation of the reticular groove by zinc is responsible for the exacerbation of toxicity when zinc sulphate is delivered by drenching gun.

The effect of zinc on the destination of fluids administered by drenching gun to sheep was determined by a crystal violet dye-indicator-slaughter method. Zinc in drench solutions produced more direct passage of drench to the abomasum as indicated by increased dye staining of abomasal and omasal mucosa and abomasal contents. Stimulation of the reticular groove reflex is suggested. Increased concentrations of zinc increased the effect. The stimulatory effect was similar to that produced by copper salts.