1. Chemical Vapor Deposition of an Iridium Phase on Hafnium Carbide and Tantalum Carbide
- Author
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V. V. Lozanov, N. I. Baklanova, Natalya B. Morozova, I. Yu. Il’in, and Sergey V. Trubin
- Subjects
Materials science ,Materials Science (miscellaneous) ,Intermetallic ,chemistry.chemical_element ,Chemical vapor deposition ,Nanocrystalline material ,Hafnium ,Carbide ,Inorganic Chemistry ,chemistry.chemical_compound ,Chemical engineering ,chemistry ,X-ray photoelectron spectroscopy ,Iridium ,Physical and Theoretical Chemistry ,Tantalum carbide - Abstract
Nanocrystalline iridium coatings on hafnium carbide and tantalum carbide substrates are prepared by chemical vapor deposition (MOCVD) at 600°С. Subsequent high-temperature treatment at 1100°С gives rise to chemical reactions between iridium and hafnium carbide or tantalum carbide to yield nanosized substitutional intermetallic solid solutions MIr3 – x and evolve free carbon. The occurrence of intermetallic interaction is proved by X-ray photoelectron (XPS) spectroscopy.
- Published
- 2020
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