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High resolution monochromatic synchrotron-radiation diffraction images of five, high quality epitaxial heterojunctions on silicon, gallium arsenide, and indium phosphide substrates display several forms of accommodation to lattice mismatch. From the images, we deduce a coherent set of factors for the loss of crystalline order in layered semiconducting crystals. Lattice mismatch is demonstrated in each of the systems by warping after layer deposition. Nevertheless, local lattice orientation is maintained across each layer interface. In two of the systems, one severely mismatched while the other is not, no arrays of dislocations appear. Sets of mixed linear lattice mismatch dislocations, consistent with identification as 60° dislocations, are found in two of the other systems with intermediate degrees of mismatch. A set of pure edge dislocations penetrating all layers is found in a system with a grid structure. These observations indicate that the formation of extensive arrays of dislocations during uniform one micrometer layer deposition depends not only on the extent of lattice mismatch and layer thickness but also on the degree of crystalline order of the substrate. Establishment of a nonpseudomorphic layer mismatched with the substrate by several tenths of a percent is an important factor, as previously determined. However, localized absence of crystalline order, e.g. in the form of scratches or dislocations in the substrate, appears also to be required for the formation of arrays of interface mismatch dislocations. Where these criteria are not fulfilled, the formation of dislocations in uniform layered systems is inhibited. Localized residual stress can initiate dislocation formation even where it would not appear in uniform layers. The images show also that crystalline disorder in state-of-the-art indium phosphide differs markedly from that in comparable gallium arsenide. Understanding of crystalline order in both monolithic materials is extended by this work.

The hole-mobility•carrier-lifetime product of α mercuric iodide high energy radiation detectors has been enhanced through vapor crystal growth in microgravity. This improvement is closely correlated with specific characteristics of the crystal lattice, which have been identified by high resolution synchrotron x-ray diffraction imaging. These structural features and the associated performance are now being approached in terrestrial growth of α mercuric iodide.Gravity may affect the uniformity of this crystal lattice in two distinct ways: 1) directly through deformation that it imposes on the lattice during growth and 2) indirectly through convection, which mixes any extraneous material. Inclusions associated with these processes harden the lattice and facilitate lattice folding. These changes affect the electronic parameters of detectors made from the crystals. As purification procedures are optimized, the incorporation of extraneous material is curtailed, enhancing electronic properties in spite of lattice flexing through loss of precipitation hardening.These studies provide insight into the contribution of various aspects of crystalline order in α-mercuric iodide crystals to property improvement. This knowledge has led to modification of requirements for starting materials, adjustment of physical vapor growth procedures, and change in crystal handling procedures. As a result, the electronic performance of terrestrially grown radiation detectors has been improved, and we provide evidence that further enhancement is still possible.

The formation of mismatch dislocations in layered semiconductor structures was found recently in high resolution monochromatic synchrotron x-radiation diffraction images to be correlated with characteristics of the substrate as well as with the layer thickness and degree of lattice mismatch of non pseudomorphic layers.1,2We have now extended these studies to examine the accommodation to strain as a function of lattice mismatch in a series of high electron mobility transistor (HEMT) structures grown by molecular beam epitaxy (MBE) on indium phosphide substrates.Five distinct types of irregularity are observed: 1) lattice warping, 2) the formation of a nonpseudomorphic layer, 3) the formation of extended arrays of linear mismatch dislocations at the interface between the substrate and a nonpseudomorphic layer, 4) the formation of oval regions of tweed-like local lattice variation imbedded among these arrays, and 5) extended tweed-like local lattice variation over large peripheral areas in which the formation of straight mismatch dislocation arrays is not observed.Warping of the lattice is found in nearly all layered structures. A distinct layer with a different lattice parameter but without visible misfit dislocations is formed with a mismatch of 0.27 %. With increase of the mismatch to 0.5 %, the other three forms of accommodation appear in distinct regions of the structure: arrays of mismatch dislocations; oval regions of tweed-like irregularity, oriented in the [011] direction; and peripheral regions of extended tweed-like local lattice variation.

Novel, streak-like disruption features restricted to the plane of diffraction have recently been observed in images obtained by synchrotron radiation diffraction from undoped, semi-insulating gallium arsenide crystals. These features were identified as ensembles of very thin platelets or interfaces lying in (110) planes, and a structural model consisting of antiphase domain boundaries was proposed. We report here the other principal features observed in high resolution monochromatic synchrotron radiation diffraction images: (quasi) cellular structure; linear, very low-angle subgrain boundaries in (110) directions, and surface stripes in a (110) direction. In addition, we report systematic differences in the acceptance angle for images involving various diffraction vectors. When these observations are considered together, a unifying picture emerges. The presence of ensembles of thin (110) antiphase platelet regions or boundaries is generally consistent not only with the streak-like diffraction features but with the other features reported here as well. For the formation of such regions we propose two mechanisms, operating in parallel, that appear to be consistent with the various defect features observed by a variety of techniques.

Three slices from a high quality boule of bismuth silicon oxide have been examined by X-ray diffraction imaging (topography) with monochromatic synchrotron radiation. The absence of macroscopic inhomogeneous strains, which are usually found in large single crystals, permits us to observe several types of microscopic strain pattern in the form of growth striations and interface boundaries. Each is associated with distinct aspects of the crystal growth. Analysis of these strains leads to a detailed understanding of the formation of a high quality bismuth silicon oxide boule. The model developed suggests ways to realize further improvement in crystal perfection.

Structural information of special interest to crystal growers and device physicists is now available from high resolution monochromatic synchrotron diffraction imaging (topography). In this review, the importance of superior resolution in momentum transfer and in space is described, and illustrations are taken from a variety of crystals: gallium arsenide, cadmium telluride, mercuric iodide, bismuth silicon oxide, and lithium niobate. The identification and detailed understanding of local variations in crystal growth processes are shown. Finally, new experimental opportunities now available for exploitation are indicated.