1. Antiferromagnetic domain wall engineering in chromium films.
- Author
-
Logan, J. M., Kim, H. C., Rosenmann, D., Cai, Z., Divan, R., Shpyrko, O. G., and Isaacs, E. D.
- Subjects
FERROMAGNETIC materials ,CHROMIUM films ,METALLIC films ,IRON ,MICROSCOPY - Abstract
We have engineered an antiferromagnetic domain wall by utilizing a magnetic frustration effect of a thin iron cap layer deposited on a chromium film. Through lithography and wet etching, we selectively remove areas of the Fe cap layer to form a patterned ferromagnetic mask over the Cr film. Removing the Fe locally removes magnetic frustration in user-defined regions of the Cr film. We present x-ray microdiffraction microscopy results confirming the formation of a 90° spin-density wave propagation domain wall in Cr. This domain wall nucleates at the boundary defined by our Fe mask. [ABSTRACT FROM AUTHOR]
- Published
- 2012
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