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We have investigated charge and spin transport in n-type metallic GaAs nanowires (~ 10^17 cm^-3 doping level), grown by hydride vapor phase epitaxy (HVPE) on Si substrates. This was done by exciting the nanowire by tightly-focussed circularly-polarized light and by monitoring the intensity and circular polarization spectrum as a function of distance from the excitation spot. The spin-polarized photoelectrons give rise to a well-defined feature in the nearbandgap spectrum, distinct from the main line due to recombination of the spin-unpolarized electrons of the Fermi sea with the same minority photoholes. At a distance of 2 (micro)m, only the main line remains, implying that photoelectrons have reached a charge thermodynamic equilibrium with the Fermi sea. However, although no line is present in the intensity spectrum at the corresponding energy, the circular polarization is still observed at the same energy in the spectrum, implying that photoelectrons have preserved their spin orientation and that the two spin reservoirs remain distinct. Investigations as a function of distance to the excitation spot show that, depending on excitation power, a photoelectron spin polarization of 20% can be transported over a record distance of more than 20 (micro)m. This finding has potential applications for long distance spin transport in n-type doped nanowires.

We show evidence that tunnel junctions (TJs) in GaN grown by metal-organic vapor phase epitaxy are dominated by trap-assisted (Poole-Frenkel) tunneling. This stems from observations of the careful optimized doping for the TJs. Especially the p$^{++}$ and the n$^{++}$ layers are far from ideal. The n$^{++}$ layer induces 3D growth, which can be seen by a rising oxygen signal in Secondary Ions Mass Spectroscopy (SIMS). Furthermore, Mg segregation observed by SIMS indicates a depletion region of more than 10 nm. Still, we could realize TJ based LEDs with a low penalty voltage of 1.1 V and a specific differential resistance of about 10$^{-2}$ $\Omega$.cm$^2$ at 20 mA without using an InGaN interlayer.