1. Role of impurities and dislocations for the unintentional n-type conductivity in InN
- Author
-
Vanya Darakchieva, F. Giuliani, Mengyao Xie, N.P. Barradas, Ching-Lien Hsiao, Li-Wei Tu, Frans Munnik, Per Persson, William J. Schaff, Mathias Schubert, Eduardo Alves, and Katharina Lorenz
- Subjects
Free electron model ,Materials science ,Impurity ,Doping ,Analytical chemistry ,Electrical and Electronic Engineering ,Conductivity ,Thin film ,Dislocation ,Condensed Matter Physics ,Acceptor ,Electronic, Optical and Magnetic Materials ,Molecular beam epitaxy - Abstract
We present a study on the role of dislocations and impurities for the unintentional n-type conductivity in high-quality InN grown by molecular beam epitaxy. The dislocation densities and H profiles in films with free electron concentrations in the low 10 17 cm - 3 and mid 10 18 cm - 3 range are measured, and analyzed in a comparative manner. It is shown that dislocations alone could not account for the free electron behavior in the InN films. On the other hand, large concentrations of H sufficient to explain, but exceeding substantially, the observed free electron densities are found. Furthermore, enhanced concentrations of H are revealed at the film surfaces, resembling the free electron behavior with surface electron accumulation. The low-conductive film was found to contain C and it is suggested that C passivates the H donors or acts as an acceptor, producing compensated material in this case. Therefore, it is concluded that the unintentional impurities play an important role for the unintentional n-type conductivity in InN. We suggest a scenario of H incorporation in InN that may reconcile the previously reported observations for the different role of impurities and dislocations for the unintentional n-type conductivity in InN.
- Published
- 2009
- Full Text
- View/download PDF