1. A study on phase transformation of SnOx thin films prepared by reactive magnetron sputtering
- Author
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Liangqi Ouyang, Mingjie Cao, Li Guo, Hao Tan, Daming Zhuang, Ming Zhao, and Qianming Gong
- Subjects
010302 applied physics ,Electron mobility ,Materials science ,Band gap ,business.industry ,Mechanical Engineering ,chemistry.chemical_element ,Nanotechnology ,02 engineering and technology ,Substrate (electronics) ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Amorphous solid ,chemistry ,Mechanics of Materials ,Thin-film transistor ,Sputtering ,0103 physical sciences ,Optoelectronics ,General Materials Science ,Thin film ,0210 nano-technology ,Tin ,business - Abstract
In the paper, SnOx thin films were deposited by reactive magnetron sputtering from a tin target in O2 containing working gas. The evolution from Sn-containing SnO to tetravalent SnO2 films was investigated. The films could be classified into three groups according to their optical band gaps, which are Eg 3.7 eV. The electric measurements show that high conductivity can be obtained much easier in SnO2 than in SnO films. A high electron mobility of 15.7 cm2 V−1 s−1, a carrier concentration of 1.43×1020 cm−3 and a resistivity of 2.8×10−3 Ω cm have been achieved in amorphous SnO2 films. Films with the optical band gap of 3.0–3.3 eV remain amorphous though the substrate temperature is as high as 300 °C, which implies that °btaining high mobility in p-type SnO is more challenging in contrast to n-type SnO2 films.
- Published
- 2016
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