Search

Halide vapor phase epitaxial (HVPE) Ga2O3 films were grown on c-plane sapphire and diamond substrates at temperatures up to 550 °C without the use of a barrier dielectric layer to protect the diamond surface. Corundum phase α-Ga2O3 was grown on the sapphire substrates, whereas the growth on diamond resulted in regions of nanocrystalline β-Ga2O3 (nc-β-Ga2O3) when oxygen was present in the HVPE reactor only during film growth. X-ray diffraction confirmed the growth of α-Ga2O3 on sapphire but failed to detect any β-Ga2O3 reflections from the films grown on diamond. These films were further characterized via Raman spectroscopy, which revealed the β-Ga2O3 phase of these films. Transmission electron microscopy demonstrated the nanocrystalline character of these films. From cathodoluminescence spectra, three emission bands, UVL′, UVL, and BL, were observed for both the α-Ga2O3/sapphire and nc-Ga2O3/diamond, and these bands were centered at approximately 3.7, 3.2, and 2.7 eV. [ABSTRACT FROM AUTHOR]

Fundamental research and development of ultra-wide bandgap (UWBG) semiconductor devices are under way to realize next-generation power conversion and wireless communication systems. Devices based on aluminum gallium nitride (AlxGa1−xN, x is the Al composition), β-phase gallium oxide (β-Ga2O3), and diamond give promise to the development of power switching devices and radio frequency power amplifiers with higher performance and efficiency than commercial wide bandgap semiconductor devices based on gallium nitride (GaN) and silicon carbide (SiC). However, one of the most critical challenges for the successful deployment of UWBG device technologies is to overcome adverse thermal effects that impact the device performance and reliability. Overheating of UWBG devices originates from the projected high power density operation and poor intrinsic thermal properties of AlxGa1−xN and β-Ga2O3. This Perspective delineates the need and process for the "electro-thermal co-design" of laterally configured UWBG electronic devices and provides a comprehensive review of current state-of-the-art thermal characterization methods, device thermal modeling practices, and both device- and package-level thermal management solutions. [ABSTRACT FROM AUTHOR]

Because of its ultra-wide bandgap, high breakdown electric field, and large-area affordable substrates grown from the melt, β-Ga2O3 has attracted great attention recently for potential applications of power electronics. However, its thermal conductivity is significantly lower than those of other wide bandgap semiconductors, such as AlN, SiC, GaN, and diamond. To ensure reliable operation with minimal self-heating at high power, proper thermal management is even more essential for Ga2O3 devices. Similar to the past approaches aiming to alleviate self-heating in GaN high electron mobility transistors, a possible solution has been to integrate thin Ga2O3 membranes with diamond to fabricate Ga2O3-on-diamond lateral metal-semiconductor field-effect transistor or metal-oxide-semiconductor field-effect transistor devices by taking advantage of the ultra-high thermal conductivity of diamond. Even though the thermal boundary conductance (TBC) between wide bandgap semiconductor devices and a diamond substrate is of primary importance for heat dissipation in these devices, fundamental understanding of the Ga2O3-diamond thermal interface is still missing. In this work, we study the thermal transport across the interfaces of Ga2O3 exfoliated onto a single crystal diamond. The van der Waals bonded Ga2O3-diamond TBC is measured to be 17 −1.7/+2.0 MW/m2 K, which is comparable to the TBC of several physical-vapor-deposited metals on diamond. A Landauer approach is used to help understand phonon transport across a perfect Ga2O3-diamond interface, which in turn sheds light on the possible TBC one could achieve with an optimized interface. A reduced thermal conductivity of the Ga2O3 nano-membrane is also observed due to additional phonon-membrane boundary scattering. The impact of the Ga2O3–substrate TBC and substrate thermal conductivity on the thermal performance of a power device is modeled and discussed. Without loss of generality, this study is not only important for Ga2O3 power electronics applications which would not be realistic without a thermal management solution but also for the fundamental thermal science of heat transport across van der Waals bonded interfaces. [ABSTRACT FROM AUTHOR]

A finite-element model coupling 2-D electron gas (2-DEG) density, piezoelectric polarization charge Q{\bf P}, and intrinsic stress induced by a nanocrystalline diamond capping layer, was developed for AlGaN/GaN high electron mobility transistors. Assuming the surface potential is unchanged by an additional stress from diamond capping, tensile stress from the diamond cap leads to an additional tensile stress in the heterostructure and, thus an increase in the 2-DEG under the gate. As a result, additional compressive stress near the gate edges would develop and lead to decreased 2-DEG in the regions between the source and drain contacts (SDCs). Increased saturation drain current will be due to the reduced total resistance between SDC. Integration of the 2-DEG density from SDC revealed a redistribution of sheet density with total sheet charge concentration remaining unchanged. The modeling results were compared with the experimental data from Raman spectroscopy and I-V characterization, and good agreements were obtained. [ABSTRACT FROM AUTHOR]

A novel Schottky-like rectifying heterojunction between two low-doped widebandgap semiconductors is presented. The conduction mechanism of p-type nanocrystalline diamond and n-type 4H-SiC with a near-unity ideality factor was determined via two-terminal current-voltage measurements as a function of temperature and SiC doping concentration. $I$ – $V$ characteristics at 300 and 510 K were fit at low forward bias with good agreement using thermionic emission theory. A wide temperature range ideality factor analysis revealed a thermionic-field rectifying barrier to low-doped and moderately doped SiC epilayers, which could lead to improved contacts for SiC-based piezoresistors, resonators, and microelectromechanical systems. [ABSTRACT FROM AUTHOR]

In this split-wafer study, we have compared the dc, pulsed, small and large signal RF electrical performance of nanocrystalline diamond (NCD) coated AlGaN/GaN high electron mobility transistors (HEMTs) to reference devices with silicon nitride passivation only. The NCD-coated HEMTs were observed to outperform reference devices in transconductance, large-signal gain, output power density, and power-added efficiency at 4 GHz. The measured improvements were suspected to be related to reduced dispersion and lower source access resistance afforded by the NCD film. [ABSTRACT FROM AUTHOR]

Boron-doped p^+ nanocrystalline diamond (NCD) films are implemented as heat spreading gate contacts to AlGaN/GaN high-electron-mobility transistors. This device demonstrates a reduced ON-resistance, reduced gate leakage, and significantly increased ON-state current density compared with the reference Ni/Au-gated devices from the same wafer. The NCD gate electrode is thermally stable, chemically stable, optically transparent, and places a heat spreading film in direct contact with the gate edge, which is the hottest part of the device. [ABSTRACT FROM AUTHOR]

A heterojunction between thin films of nanocrystalline diamond (NCD) and 4H-SiC has been developed. Undoped and B-doped NCDs were deposited on both n- and p- SiC epilayers. I-V measurements on p+ NCD/n- SiC indicated Schottky rectifying behavior with a turn-on voltage of around 0.2 V. The current increased over eight orders of magnitude with an ideality factor of 1.17 at 30 °C. Ideal energy-band diagrams suggested a possible conduction mechanism for electron transport from the SiC conduction band to either the valence band or acceptor level of the NCD film. Applications as an UV semitransparent electrical contact to 4H-SiC are discussed. [ABSTRACT FROM AUTHOR]