1. ALD-Derived, Low-Density Alumina as Solid Electrolyte in Printed Low-Voltage FETs.
- Author
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Neuper, Felix Joachim, Marques, Gabriel Cadilha, Singaraju, Surya Abhishek, Kruk, Robert, Aghassi-Hagmann, Jasmin, Hahn, Horst, and Breitung, Ben
- Subjects
SOLID electrolytes ,ELECTRIC double layer ,ALUMINA composites ,ATOMIC layer deposition ,FIELD-effect transistors ,TRANSISTORS ,HUMIDITY - Abstract
In this report, we have studied field-effect transistors (FETs) using low-density alumina for electrolytic gating. Device layers have been prepared starting from the structured ITO glasses by printing the In
2 O3 channels, low-temperature atomic layer deposition (ALD) of alumina (Al2 O3 ), and printing graphene top gates. The transistor performance could be deliberately changed by alternating the ambient humidity; furthermore, ID,ON /ID,OFF -ratios of up to seven orders of magnitude and threshold voltages between 0.66 and 0.43 V, decreasing with an increasing relative humidity between 40% and 90%, could be achieved. In contrast to the common usage of Al2 O3 as the dielectric in the FETs, our devices show electrolyte-type gating behavior. This is a result from the formation of protons on the Al2 O3 surfaces at higher humidities. Due to the very high local capacitances of the Helmholtz double layers at the channel surfaces, the operation voltage can be as low as 1 V. At low humidities (≤30%), the solid electrolyte dries out and the performance breaks down; however, it can fully reversibly be regained upon a humidity increase. Using ALD-derived alumina as solid electrolyte gating material, thus, allows low-voltage operation and provides a chemically stable gating material while maintaining low process temperatures. However, it has proven to be highly humidity-dependent in its performance. [ABSTRACT FROM AUTHOR]- Published
- 2020
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