1. Use of Supramolecular Assemblies as Lithographic Resists.
- Author
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Lewis, Scott M., Fernandez, Antonio, DeRose, Guy A., Hunt, Matthew S., Whitehead, George F. S., Lagzda, Agnese, Alty, Hayden R., Ferrando ‐ Soria, Jesus, Varey, Sarah, Kostopoulos, Andreas K., Schedin, Fredrik, Muryn, Christopher A., Timco, Grigore A., Scherer, Axel, Yeates, Stephen G., and Winpenny, Richard E. P.
- Subjects
SUPRAMOLECULES ,MOLECULAR self-assembly ,MOLECULAR structure ,ELECTRON beam lithography ,PLASMA gases - Abstract
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. [ABSTRACT FROM AUTHOR]
- Published
- 2017
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