1. Engineering Barrier and Buffer Layers in InGaAs Quantum-Well MOSFETs.
- Author
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Morassi, Luca, Verzellesi, Giovanni, Zhao, Han, Lee, Jack C., Veksler, Dmitry, and Bersuker, Gennadi
- Subjects
ELECTRIC conductivity ,ELECTRON mobility ,ENERGY-band theory of solids ,FREE electron theory of metals ,ELECTRONICS - Abstract
Properties of InGaAs buried-channel quantum-well MOSFETs affected by the barrier and buffer layers are analyzed by numerical simulations to assist device engineering and optimization. The interplay between the charge-neutrality level position at the barrier/dielectric interface and conduction band discontinuity at the barrier/channel interface is shown to critically impact the achievement of an enhancement-mode device with full turn-on. A p-doped buffer is found to be a more suitable option than the standard unintentionally doped buffers to control short-channel effects. [ABSTRACT FROM AUTHOR]
- Published
- 2012
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